| 6985847 |
System and method for process matching |
Christophe Pierrat |
2006-01-10 |
| 6519501 |
Method of determining optimum exposure threshold for a given photolithographic model |
Christophe Pierrat |
2003-02-11 |
| 6463403 |
System and method for process matching |
Christophe Pierrat |
2002-10-08 |
| 6319644 |
Methods of reducing proximity effects in lithographic processes |
Christophe Pierrat, William Baggenstoss, William A. Stanton |
2001-11-20 |
| 6284419 |
Methods of reducing proximity effects in lithographic processes |
Christophe Pierrat, William Baggenstoss, William A. Stanton |
2001-09-04 |
| 6272236 |
Inspection technique of photomask |
Christophe Pierrat |
2001-08-07 |
| 6178360 |
Methods and apparatus for determining optimum exposure threshold for a given photolithographic model |
Christophe Pierrat |
2001-01-23 |
| 6120952 |
Methods of reducing proximity effects in lithographic processes |
Christophe Pierrat, William Baggenstoss, William A. Stanton |
2000-09-19 |
| 6091845 |
Inspection technique of photomask |
Christophe Pierrat |
2000-07-18 |
| 6033814 |
Method for multiple process parameter matching |
Christophe Pierrat |
2000-03-07 |
| 5795688 |
Process for detecting defects in photomasks through aerial image comparisons |
Christophe Pierrat |
1998-08-18 |
