| 8101454 |
Method of forming pixel cell having a grated interface |
— |
2012-01-24 |
| 7880255 |
Pixel cell having a grated interface |
— |
2011-02-01 |
| 7229724 |
Reticles and methods of forming and using the same |
Byron Neville Burgess, Erik Byers, William A. Stanton |
2007-06-12 |
| 7105278 |
Pattern mask with features to minimize the effect of aberrations |
Pary Baluswamy, William A. Stanton |
2006-09-12 |
| 6854106 |
Reticles and methods of forming and using the same |
Byron Neville Burgess, Erik Byers, William A. Stanton |
2005-02-08 |
| 6803157 |
Pattern mask with features to minimize the effect of aberrations |
Pary Baluswamy, William A. Stanton |
2004-10-12 |
| 6401236 |
Method to eliminate side lobe printing of attenuated phase shift |
William A. Stanton |
2002-06-04 |
| 6319644 |
Methods of reducing proximity effects in lithographic processes |
Christophe Pierrat, James Burdorf, William A. Stanton |
2001-11-20 |
| 6284419 |
Methods of reducing proximity effects in lithographic processes |
Christophe Pierrat, James Burdorf, William A. Stanton |
2001-09-04 |
| 6120952 |
Methods of reducing proximity effects in lithographic processes |
Christophe Pierrat, James Burdorf, William A. Stanton |
2000-09-19 |
