Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8323859 | Optical compensation devices, systems, and methods | Xinya Lei, Fei Wang | 2012-12-04 |
| 8062814 | Optical compensation devices, systems, and methods | Xinya Lei, Fei Wang | 2011-11-22 |
| 7862964 | Methods for photo-processing photo-imageable material | — | 2011-01-04 |
| 7790338 | Optical compensation devices, systems, and methods | Xinya Lei, Fei Wang | 2010-09-07 |
| 7767363 | Methods for photo-processing photo-imageable material | — | 2010-08-03 |
| 7655384 | Methods for reducing spherical aberration effects in photolithography | — | 2010-02-02 |
| 7268869 | In-situ spectrograph and method of measuring light wavelength characteristics for photolithography | — | 2007-09-11 |
| 7223674 | Methods for forming backside alignment markers useable in semiconductor lithography | Peter Benson | 2007-05-29 |
| 7105278 | Pattern mask with features to minimize the effect of aberrations | William A. Stanton, William Baggenstoss | 2006-09-12 |
| 6914017 | Residue free overlay target | Scott DeBoer, Ceredig Roberts, Tim H. Bossart | 2005-07-05 |
| 6822342 | Raised-lines overlay semiconductor targets and method of making the same | Scott DeBoer, Ceredig Roberts, Tim H. Bossart | 2004-11-23 |
| 6803157 | Pattern mask with features to minimize the effect of aberrations | William A. Stanton, William Baggenstoss | 2004-10-12 |
| 6756167 | Overlay target design method to minimize impact of lens aberrations | Richard Holscher | 2004-06-29 |
| 6675053 | Layout for measurement of overlay error | Tim H. Bossart | 2004-01-06 |
| 6514643 | Overlay target exposure device utilizing pitch determination to minimize impact of lens aberrations | Richard Holscher | 2003-02-04 |
| 6484060 | Layout for measurement of overlay error | Tim H. Bossart | 2002-11-19 |
| 6432591 | Overlay target design method with pitch determination to minimize impact of lens aberrations | Richard Holscher | 2002-08-13 |