Issued Patents All Time
Showing 1–25 of 180 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8977989 | Handling of flat data for phase processing including growing shapes within bins to identify clusters | Michel Cote | 2015-03-10 |
| 8566757 | Layout of phase shifting photolithographic masks with refined shifter shapes | Michel Cote | 2013-10-22 |
| 8479125 | Lithography modeling and applications | — | 2013-07-02 |
| 8423925 | System and method for compressed post-OPC data | — | 2013-04-16 |
| 8423924 | System and method for compressed post-OPC data | — | 2013-04-16 |
| 8316326 | System and method for applying phase effects of mask diffraction patterns | — | 2012-11-20 |
| 8278156 | Spacer double patterning for lithography operations | — | 2012-10-02 |
| 8252693 | Self-alignment for semiconductor patterns | — | 2012-08-28 |
| 8198188 | Self-aligned VIAS for semiconductor devices | — | 2012-06-12 |
| 8103984 | System and method for compressed design phase contour data | — | 2012-01-24 |
| 7932020 | Contact or proximity printing using a magnified mask image | Alfred Wong | 2011-04-26 |
| 7927928 | Spacer double patterning for lithography operations | — | 2011-04-19 |
| 7926001 | Uniformity for semiconductor patterning operations | — | 2011-04-12 |
| 7926004 | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects | Youping Zhang | 2011-04-12 |
| 7902613 | Self-alignment for semiconductor patterns | — | 2011-03-08 |
| 7739649 | Design and layout of phase shifting photolithographic masks | Michel Cote | 2010-06-15 |
| 7659042 | Full phase shifting mask in damascene process | — | 2010-02-09 |
| 7629109 | Exposure control for phase shifting photolithographic masks | Michel Cote | 2009-12-08 |
| 7614033 | Mask data preparation | Alfred Wong | 2009-11-03 |
| 7585595 | Phase shift mask including sub-resolution assist features for isolated spaces | — | 2009-09-08 |
| 7562319 | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects | Youping Zhang | 2009-07-14 |
| 7534531 | Full phase shifting mask in damascene process | — | 2009-05-19 |
| 7500217 | Handling of flat data for phase processing including growing shapes within bins to identify clusters | Michel Cote | 2009-03-03 |
| 7458056 | Effective proximity effect correction methodology | — | 2008-11-25 |
| 7435513 | Design and layout of phase shifting photolithographic masks | Michel Cote | 2008-10-14 |