Issued Patents All Time
Showing 151–175 of 180 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5995200 | Multiple image reticle for forming layers | — | 1999-11-30 |
| 5986625 | Application specific field emission display including extended emitters | Karen Huang | 1999-11-16 |
| 5976732 | Photomask for reconfiguring a circuit by exposure at two different wavelengths | J. Brett Rolfson | 1999-11-02 |
| 5972569 | Method for reducing photolithographic steps in a semiconductor interconnect process | Nanseng Jeng | 1999-10-26 |
| 5962174 | Multilayer reflective mask | — | 1999-10-05 |
| 5935740 | Method and apparatus for the fabrication of semiconductor photomask | — | 1999-08-10 |
| 5935734 | Method for fabrication of and apparatus for use as a semiconductor photomask | — | 1999-08-10 |
| 5922497 | Lithographic imaging system | — | 1999-07-13 |
| 5885734 | Process for modifying a hierarchical mask layout | Chin Le | 1999-03-23 |
| 5876878 | Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light | J. Brett Rolfson | 1999-03-02 |
| 5851734 | Process for defining resist patterns | — | 1998-12-22 |
| 5851704 | Method and apparatus for the fabrication of semiconductor photomask | — | 1998-12-22 |
| 5801954 | Process for designing and checking a mask layout | Chin Le | 1998-09-01 |
| 5798193 | Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems | Baorui Yang | 1998-08-25 |
| 5795688 | Process for detecting defects in photomasks through aerial image comparisons | James Burdorf | 1998-08-18 |
| 5780187 | Repair of reflective photomask used in semiconductor process | — | 1998-07-14 |
| 5741624 | Method for reducing photolithographic steps in a semiconductor interconnect process | Nanseng Jeng | 1998-04-21 |
| 5718829 | Phase shift structure and method of fabrication | — | 1998-02-17 |
| 5695896 | Process for fabricating a phase shifting mask | — | 1997-12-09 |
| 5686208 | Process for generating a phase level of an alternating aperture phase shifting mask | Chin Le | 1997-11-11 |
| 5633103 | Self-aligned alignment marks for phase-shifting masks | John J. DeMarco | 1997-05-27 |
| 5582939 | Method for fabricating and using defect-free phase shifting masks | — | 1996-12-10 |
| 5405721 | Phase-shifting lithographic masks having phase-shifting layers of differing compositions | — | 1995-04-11 |
| 5338626 | Fabrication of phase-shifting lithographic masks | Joseph Garofalo, Robert L. Kostelak, Jr., Sheila Vaidya | 1994-08-16 |
| 5308721 | Self-aligned method of making phase-shifting lithograhic masks having three or more phase-shifts | Joseph Garofalo | 1994-05-03 |