NJ

Nanseng Jeng

Micron: 51 patents #346 of 6,345Top 6%
Overall (All Time): #51,263 of 4,157,543Top 2%
52
Patents All Time

Issued Patents All Time

Showing 25 most recent of 52 patents

Patent #TitleCo-InventorsDate
6936897 Intermediate structure having a silicon barrier layer encapsulating a semiconductor substrate Pai-Hung Pan 2005-08-30
6930363 Barrier in gate stack for improved gate dielectric integrity Aftab Ahmad 2005-08-16
6917411 Method for optimizing printing of an alternating phase shift mask having a phase shift error Christophe Pierrat 2005-07-12
6835634 Streamlined field isolation process Pierre C. Fazan, Viju K. Mathews 2004-12-28
6809395 Isolation structure having trench structures formed on both side of a locos Fernando Gonzales, Mike Violette, Aftab Ahmad, Klaus Schuegraf 2004-10-26
6770571 Barrier in gate stack for improved gate dielectric integrity Aftab Ahmad 2004-08-03
6762475 Semiconductor wafer isolation structure formed by field oxidation Viju K. Mathews, Pierre C. Fazan 2004-07-13
6611038 Semiconductor wafer isolation structure formed by field oxidation Viju K. Mathews, Pierre C. Fazan 2003-08-26
6562730 Barrier in gate stack for improved gate dielectric integrity 2003-05-13
6472280 Method for forming a spacer for semiconductor manufacture Christophe Pierrat 2002-10-29
6432619 Method for reducing photolithographic steps in a semiconductor interconnect process Christophe Pierrat 2002-08-13
6373114 Barrier in gate stack for improved gate dielectric integrity Aftab Ahmad 2002-04-16
6365490 Process to improve the flow of oxide during field oxidation by fluorine doping Viju K. Mathews, Pierre C. Fazan 2002-04-02
6337172 Method for reducing photolithographic steps in a semiconductor interconnect process Christophe Pierrat 2002-01-08
6245671 Semiconductor processing method of forming an electrically conductive contact plug Viju K. Mathews, Pierre C. Fazan 2001-06-12
6232191 Method for forming a spacer for semiconductor manufacture Christophe Pierrat 2001-05-15
6225174 Method for forming a spacer using photosensitive material Christophe Pierrat 2001-05-01
6221564 Method for forming a spacer out of photosensitive material Christophe Pierrat 2001-04-24
6127096 Method for reducing photolithographic steps in a semiconductor interconnect process Christophe Pierrat 2000-10-03
6114218 Texturized polycrystalline silicon to aid field oxide formation 2000-09-05
6103595 Assisted local oxidation of silicon 2000-08-15
6090685 Method of forming a LOCOS trench isolation structure Fernando Gonzales, Mike Violette, Aftab Ahmad, Klaus Schuegraf 2000-07-18
6077740 Method for forming a semiconductor device contact structure comprising a contour Steven T. Harshfield, Paul J. Schuele 2000-06-20
6069059 Well-drive anneal technique using preplacement of nitride films for enhanced field isolation Pai-Hung Pan 2000-05-30
5972569 Method for reducing photolithographic steps in a semiconductor interconnect process Christophe Pierrat 1999-10-26