Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5963820 | Method for forming field oxide or other insulators during the formation of a semiconductor device | — | 1999-10-05 |
| 5940692 | Method of forming a field effect transistor | Viju K. Mathews, Pierre C. Fazan | 1999-08-17 |
| 5933754 | Semiconductor processing method of forming an electrically conductive contact plug | Viju K. Mathews, Pierre C. Fazan | 1999-08-03 |
| 5902128 | Process to improve the flow of oxide during field oxidation by fluorine doping | Viju K. Mathews, Pierre C. Fazan | 1999-05-11 |
| 5891788 | Locus isolation technique using high pressure oxidation (hipox) and protective spacers | Pierre C. Fazan, Viju K. Mathews | 1999-04-06 |
| 5888881 | Method of trench isolation during the formation of a semiconductor device | Thomas A. Figura | 1999-03-30 |
| 5837596 | Field oxide formation by oxidation of polysilicon layer | Thomas A. Figura | 1998-11-17 |
| 5837378 | Method of reducing stress-induced defects in silicon | Viju K. Mathews, Pierre C. Fazan, Thomas A. Figura | 1998-11-17 |
| 5798280 | Process for doping hemispherical grain silicon | Viju K. Mathews, Pierre C. Fazan | 1998-08-25 |
| 5753962 | Texturized polycrystalline silicon to aid field oxide formation | — | 1998-05-19 |
| 5741624 | Method for reducing photolithographic steps in a semiconductor interconnect process | Christophe Pierrat | 1998-04-21 |
| 5726092 | Semiconductor processing methods of forming field oxidation regions on a semiconductor substrate | Viju K. Mathews, Pierre C. Fazan | 1998-03-10 |
| 5719418 | Contact-substrate for a semiconductor device comprising a contour | Steven T. Harshfield, Paul J. Schuele | 1998-02-17 |
| 5702986 | Low-stress method of fabricating field-effect transistors having silicon nitride spacers on gate electrode edges | Viju K. Mathews, Pierre C. Fazan | 1997-12-30 |
| 5674776 | Semiconductor processing methods of forming field oxidation regions on a semiconductor substrate | Viju K. Mathews, Pierre C. Fazan | 1997-10-07 |
| 5661072 | Method for reducing oxide thinning during the formation of a semiconductor device | — | 1997-08-26 |
| 5661073 | Method for forming field oxide having uniform thickness | — | 1997-08-26 |
| 5658829 | Semiconductor processing method of forming an electrically conductive contact plug | Viju K. Mathews, Pierre C. Fazan | 1997-08-19 |
| 5637514 | Method of forming a field effect transistor | Viju K. Mathews, Pierre C. Fazan | 1997-06-10 |
| 5629230 | Semiconductor processing method of forming field oxide regions on a semiconductor substrate utilizing a laterally outward projecting foot portion | Pierre C. Fazan, David Dickerson | 1997-05-13 |
| 5612248 | Method for forming field oxide or other insulators during the formation of a semiconductor device | — | 1997-03-18 |
| 5580821 | Semiconductor processing method of forming an electrically conductive contact plug | Viju K. Mathews, Pierre C. Fazan | 1996-12-03 |
| 5508215 | Current leakage reduction at the storage node diffusion region of a stacked-trench dram cell by selectively oxidizing the floor of the trench | — | 1996-04-16 |
| 5492853 | Method of forming a contact using a trench and an insulation layer during the formation of a semiconductor device | Steven T. Harshfield, Paul J. Schuele | 1996-02-20 |
| 5472904 | Thermal trench isolation | Thomas A. Figura | 1995-12-05 |