YN

Yukio Nishimura

JS Jsr: 41 patents #2 of 1,137Top 1%
Fujitsu Limited: 5 patents #6,029 of 24,456Top 25%
IBM: 4 patents #21,733 of 70,183Top 35%
AT Agilent Technologies: 1 patents #1,723 of 3,411Top 55%
JE Jeol: 1 patents #309 of 669Top 50%
University Of Texas System: 1 patents #2,951 of 6,559Top 45%
HI Hitachi: 1 patents #17,742 of 28,497Top 65%
HI Hitachi Video Engineering, Incorporated: 1 patents #69 of 181Top 40%
📍 Tokyo, CA: #162 of 583 inventorsTop 30%
Overall (All Time): #50,773 of 4,157,543Top 2%
52
Patents All Time

Issued Patents All Time

Showing 26–50 of 52 patents

Patent #TitleCo-InventorsDate
8247165 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern Toru Kimura, Tomohiro Utaka, Hiroaki Nemoto, Atsushi Nakamura, Takashi Chiba +1 more 2012-08-21
8124314 Radiation-sensitive composition Hiromu MIYATA 2012-02-28
8076053 Upper layer-forming composition and photoresist patterning method Atsushi Nakamura, Hiroki Nakagawa, Hiromitsu Nakashima, Takayuki Tsuji, Hiroshi Dougauchi +1 more 2011-12-13
7951524 Self-topcoating photoresist for photolithography Robert David Allen, Phillip Brock, Shiro Kusumoto, Daniel P. Sanders, Mark Steven Slezak +4 more 2011-05-31
7691275 Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing C. Grant Willson, Frank L. Palmieri, Stephen C. Johnson, Michael Stewart 2010-04-06
7638261 Radiation-sensitive resin composition Hiroyuki Ishii, Isao Nishimura, Eiichi Kobayashi 2009-12-29
7531286 Radiation-sensitive resin composition Hiroyuki Ishii, Masafumi Yamamoto, Isao Nishimura 2009-05-12
7521169 Radiation-sensitive resin composition Hiroyuki Ishii, Isao Nishimura, Eiichi Kobayashi 2009-04-21
7452655 Acrylic copolymer and radiation-sensitive resin composition Hiroyuki Ishii, Kouichi Fujiwara, Hiroshi Yamaguchi 2008-11-18
7217492 Onium salt compound and radiation-sensitive resin composition Eiji Yoneda, Yong Wang 2007-05-15
7213081 Dynamic determination of memory mapped input output range granularity for multi-node computer system Prabhunandan Narasimhamurthy, Sudheer Miryala, Kazunori Masuyama 2007-05-01
7202016 Radiation-sensitive resin composition Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Masafumi Yamamoto +3 more 2007-04-10
7087356 193nm resist with improved post-exposure properties Mahmoud Khojasteh, Kuang-Jung Chen, Pushkara R. Varanasi, Eiichi Kobayashi 2006-08-08
7076576 Data transfer in multi-node computer system Prabhunandan B. Narasimharmurthy, Sudheer Miryala, Kazunori Masuyama 2006-07-11
6964840 Radiation-sensitive resin composition Noboru Yamahara, Masafumi Yamamoto, Toru Kajita, Tsutomu Shimokawa, Hiroshi Ito 2005-11-15
6961761 System and method for partitioning a computer system into domains Kazunori Masuyama, Patrick Conway, Hitoshi Oi, Jeremy J. Farrell, Sudheer Miryala +1 more 2005-11-01
6943826 Apparatus for debugging imaging devices and method of testing imaging devices Hiroshi Tatekawa, Katsumi Sakamoto 2005-09-13
6933094 Radiation-sensitive resin composition Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Masafumi Yamamoto +3 more 2005-08-23
6908722 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition Satoshi Ebata, Eiji Yoneda, Tomoki Nagai, Tatsuya Toneri, Yong Wang +1 more 2005-06-21
6838225 Radiation-sensitive resin composition Masafumi Yamamoto, Atsuko Kataoka, Toru Kajita 2005-01-04
6800414 Radiation-sensitive resin composition Noboru Yamahara, Masafumi Yamamoto, Toru Kajita, Tsutomu Shimokawa, Hiroshi Ito 2004-10-05
6800419 Radiation-sensitive resin composition Akimasa Soyano, Hiroyuki Ishii, Hidemitsu Ishida, Motoyuki Shima 2004-10-05
6753124 Radiation-sensitive resin composition Katsuji Douki, Toru Kajita, Tsutomu Shimokawa 2004-06-22
6677419 Preparation of copolymers Phillip Brock, Eiichi Kobayashi, Isao Nishimura, Thomas I. Wallow, Masafumi Yamamoto 2004-01-13
6403288 Resist pattern formation method Toshiyuki Kai, Eiichi Kobayashi, Takeo Shioya 2002-06-11