| 10170280 |
Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall |
Madhavi R. Chandrachood, Michael N. Grimbergen, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim +1 more |
2019-01-01 |
| 9218944 |
Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors |
Madhavi R. Chandrachood, Michael N. Grimbergen, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim +1 more |
2015-12-22 |
| 8568553 |
Method and apparatus for photomask plasma etching |
Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Amitabh Sabharwal +1 more |
2013-10-29 |
| 8017029 |
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside |
Madhavi R. Chandrachood, Michael N. Grimbergen, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim +1 more |
2011-09-13 |
| 7976671 |
Mask etch plasma reactor with variable process gas distribution |
Madhavi R. Chandrachood, Michael N. Grimbergen, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim +1 more |
2011-07-12 |
| 7943005 |
Method and apparatus for photomask plasma etching |
Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Amitabh Sabharwal +1 more |
2011-05-17 |
| 7909961 |
Method and apparatus for photomask plasma etching |
Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Amitabh Sabharwal +1 more |
2011-03-22 |
| 7520999 |
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another |
Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more |
2009-04-21 |
| 7504041 |
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator |
Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more |
2009-03-17 |
| 7431797 |
Plasma reactor with a dynamically adjustable plasma source power applicator |
Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more |
2008-10-07 |
| 7419551 |
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another |
Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more |
2008-09-02 |
| 7341907 |
Single wafer thermal CVD processes for hemispherical grained silicon and nano-crystalline grain-sized polysilicon |
Ming Li, Kevin Cunningham, Guangcai Xing, R. Suryanarayanan Iyer |
2008-03-11 |
| 7335266 |
Method of forming a controlled and uniform lightly phosphorous doped silicon film |
Li Fu, Shulin Wang, Christopher Quentin, Lee Luo, Aihua Chen +1 more |
2008-02-26 |
| 7265036 |
Deposition of nano-crystal silicon using a single wafer chamber |
Ming Li, Shulin Wang, Jonathan Pickering |
2007-09-04 |
| 6982214 |
Method of forming a controlled and uniform lightly phosphorous doped silicon film |
Li Fu, Shulin Wang, Christopher Quentin, Lee Luo, Aihua Chen +1 more |
2006-01-03 |
