NM

Nobuo Matsuki

AK Asm Japan K.K.: 36 patents #1 of 128Top 1%
SC Sekisui Chemical Co.: 2 patents #358 of 908Top 40%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
Canon: 1 patents #14,899 of 19,416Top 80%
Samsung: 1 patents #49,284 of 75,807Top 70%
Overall (All Time): #77,692 of 4,157,543Top 2%
40
Patents All Time

Issued Patents All Time

Showing 1–25 of 40 patents

Patent #TitleCo-InventorsDate
12241155 Method for forming insulation film 2025-03-04
11850827 Interlayer film for laminated glass and laminated glass Shinji Kawada 2023-12-26
11491768 Intermediate film for laminated glass, and laminated glass Yuki Ishikawa, Shinji Kawada, Tatsuya Iwamoto 2022-11-08
10738380 Deposition apparatus Naoyuki Nozawa, Reiji Sakamoto, Masahito Ishihara 2020-08-11
8080282 Method for forming silicon carbide film containing oxygen Atsuki Fukazawa, Manabu Kato 2011-12-20
8003174 Method for forming dielectric film using siloxane-silazane mixture Atsuki Fukazawa, Woo Jin Lee 2011-08-23
7781352 Method for forming inorganic silazane-based dielectric film Atsuki Fukazawa, Jeongseok Ha 2010-08-24
7718553 Method for forming insulation film having high density Atsuki Fukazawa 2010-05-18
7655577 Method of forming silicon-containing insulation film having low dielectric constant and low film stress Yasuyoshi Hyodo, Masashi Yamaguchi, Atsuki Fukazawa, Naoki Ohara, Yijun Liu 2010-02-02
7651959 Method for forming silazane-based dielectric film Atsuki Fukazawa, Jeongseok Ha 2010-01-26
7638441 Method of forming a carbon polymer film using plasma CVD Yoshinori Morisada, Kamal Kishore Goundar 2009-12-29
7622369 Device isolation technology on semiconductor substrate Woo Jin Lee, Atsuki Fukazawa 2009-11-24
7560144 Method of stabilizing film quality of low-dielectric constant film Atsuki Fukazawa, Kiyoto Itoh, Tsunayuki Kimura 2009-07-14
7504344 Method of forming a carbon polymer film using plasma CVD Yoshinori Morisada, Seijiro Umemoto, Jea Sik Lee 2009-03-17
7470633 Method of forming a carbon polymer film using plasma CVD Yoshinori Morisada, Seijiro Umemoto, Jea Sik Lee 2008-12-30
7410915 Method of forming carbon polymer film using plasma CVD Yoshinori Morisada, Kamal Kishore Goundar, Masashi Yamaguchi, Kyu-Tae Na, Eun-Kyung Baek 2008-08-12
7354873 Method for forming insulation film Atsuki Fukazawa, Seijiro Umemoto 2008-04-08
7147900 Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation Naoto Tsuji, Atsuki Fukazawa, Shingo Ikeda 2006-12-12
7148154 Method of forming silicon-containing insulation film having low dielectric constant and low film stress Yasuyoshi Hyodo, Masashi Yamaguchi, Atsuki Fukazawa, Naoki Ohara, Yijun Liu 2006-12-12
7064088 Method for forming low-k hard film Yasuyoshi Hyodo, Atsuki Fukazawa, Yoshinori Morisada, Masashi Yamaguchi 2006-06-20
7012268 Gas-shield electron-beam gun for thin-film curing application Atsuki Fukazawa, Naoto Tsuji 2006-03-14
6881683 Insulation film on semiconductor substrate and method for forming same Yasuyoshi Hyodo, Masashi Yamaguchi, Yoshinori Morisada, Atsuki Fukazawa, Manabu Kato +3 more 2005-04-19
6852650 Insulation film on semiconductor substrate and method for forming same Yasuyoshi Hyodo, Masashi Yamaguchi, Yoshinori Morisada, Atsuki Fukazawa, Manabu Kato 2005-02-08
6830007 Apparatus and method for forming low dielectric constant film Seijiro Umemoto, Yasuyoshi Hyodo 2004-12-14
6784123 Insulation film on semiconductor substrate and method for forming same Yoshinori Morisada, Yasuyoshi Hyodo, Seijiro Umemoto 2004-08-31