MN

Michael P. Nault

Applied Materials: 8 patents #1,541 of 7,310Top 25%
Air Products And Chemicals: 5 patents #388 of 1,997Top 20%
Overall (All Time): #522,192 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7265062 Ionic additives for extreme low dielectric constant chemical formulations Robert P. Mandal, Alexandros T. Demos, Timothy Weidman, Nikolaos Bekiaris, Scott J. Weigel +3 more 2007-09-04
6896955 Ionic additives for extreme low dielectric constant chemical formulations Robert P. Mandal, Alexandros T. Demos, Timothy Weidman, Nikolaos Bekiaris, Scott J. Weigel +3 more 2005-05-24
6875687 Capping layer for extreme low dielectric constant films Timothy Weidman, Josephine Chang 2005-04-05
6843881 Detecting chemiluminescent radiation in the cleaning of a substrate processing chamber Bok Hoen Kim, Nam Le, Martin Jay Seamons, Ameeta Madhava, Thomas Nowak +2 more 2005-01-18
6818289 Mesoporous films having reduced dielectric constants James Edward MacDougall, Kevin Ray Heier, Scott J. Weigel, Timothy Weidman, Alexandros T. Demos +3 more 2004-11-16
6592980 Mesoporous films having reduced dielectric constants James Edward MacDougall, Kevin Ray Heier, Scott J. Weigel, Timothy Weidman, Alexandros T. Demos +3 more 2003-07-15
6583071 Ultrasonic spray coating of liquid precursor for low K dielectric coatings Timothy Weidman, Yunfeng Lu, Michael Barnes, Farhad Moghadam 2003-06-24
6576568 Ionic additives for extreme low dielectric constant chemical formulations Robert P. Mandal, Alexandros T. Demos, Timothy Weidman, Nikolaos Bekiaris, Scott J. Weigel +3 more 2003-06-10
6190233 Method and apparatus for improving gap-fill capability using chemical and physical etchbacks Soonil Hong, Choon Kun Ryu, Kaushal K. Singh, Anthony Lam, Virendra V. Rana +1 more 2001-02-20
5990000 Method and apparatus for improving gap-fill capability using chemical and physical etchbacks Soonil Hong, Choon Kun Ryu, Kaushal K. Singh, Anthony Lam, Virendra V. Rana +1 more 1999-11-23