MT

Meng Chu Tseng

Applied Materials: 9 patents #1,414 of 7,310Top 20%
Overall (All Time): #564,696 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
10847463 Seed layers for copper interconnects Zhiyuan Wu, Mehul Naik, Ben-Li Sheu 2020-11-24
6193813 Utilization of SiH4 soak and purge in deposition processes Mei Chang, Ramanujapuram A. Srinivas, Klaus-Dieter Rinnen, Moshe Eizenberg, Susan Telford 2001-02-27
5997950 Substrate having uniform tungsten silicide film and method of manufacture Susan G. Telford, Michio Aruga, Klaus-Dieter Rinnen 1999-12-07
5817576 Utilization of SiH.sub.4 soak and purge in deposition processes Mei Chang, Ramanujapuram A. Srinivas, Klaus-Dieter Rinnen, Moshe Eizenberg, Susan Telford 1998-10-06
5643633 Uniform tungsten silicide films produced by chemical vapor depostiton Susan G. Telford, Michio Aruga, Moshe Eizenberg 1997-07-01
5565382 Process for forming tungsten silicide on semiconductor wafer using dichlorosilane gas Susan Telford, Mei Chang 1996-10-15
5558910 Uniform tungsten silicide films produced by chemical vapor deposition Susan G. Telford, Michio Aruga, Moshe Eizenberg 1996-09-24
5500249 Uniform tungsten silicide films produced by chemical vapor deposition Susan G. Telford, Michio Aruga 1996-03-19
5326725 Clamping ring and susceptor therefor Semyon Sherstinsky, Charles C. Harris, Mei Chang, Dale R. Du Bois, James Roberts +3 more 1994-07-05