Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8486194 | Apparatus for efficient removal of halogen residues from etched substrates | Kenneth J. Bhang, Travis Morey, James D. Carducci | 2013-07-16 |
| 8293016 | Apparatus for efficient removal of halogen residues from etched substrates | Kenneth J. Bahng, Travis Morey, James D. Carducci | 2012-10-23 |
| 8274645 | Method and apparatus for in-situ metrology of a workpiece disposed in a vacuum processing chamber | Lei Lian, Thorsten Lill | 2012-09-25 |
| 8257546 | Method and system for monitoring an etch process | John M. Yamartino, Lei Lian | 2012-09-04 |
| 8232212 | Within-sequence metrology based process tuning for adaptive self-aligned double patterning | Thorsten Lill, Lei Lian | 2012-07-31 |
| 8130382 | Determining endpoint in a substrate process | Lei Lian | 2012-03-06 |
| 8089046 | Method and apparatus for calibrating mass flow controllers | Thorsten Lill, Quentin Ernie Walker | 2012-01-03 |
| 8009938 | Advanced process sensing and control using near infrared spectral reflectometry | Lei Lian | 2011-08-30 |
| 7969581 | Determining endpoint in a substrate process | Lei Lian | 2011-06-28 |
| 7946759 | Substrate temperature measurement by infrared transmission | Kenneth J. Bahng | 2011-05-24 |
| 7846845 | Integrated method for removal of halogen residues from etched substrates in a processing system | Kenneth J. Bahng, Thorsten Lill, Steven H. Kim | 2010-12-07 |
| 7846347 | Method for removing a halogen-containing residue | Mark Kawaguchi, James S. Papanu, Scott Williams | 2010-12-07 |
| 7815812 | Method for controlling a process for fabricating integrated devices | Lei Lian, Barbara Schmidt | 2010-10-19 |
| 7808651 | Determining endpoint in a substrate process | Lei Lian | 2010-10-05 |
| 7695987 | Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring | Lei Lian | 2010-04-13 |
| 7652774 | Interferometric endpoint determination in a substrate etching process | Lei Lian | 2010-01-26 |
| 7602484 | Method and apparatus for performing limited area spectral analysis | Lei Lian, Yasuhiro Uo, Michael D. Willwerth, Andrei Ivanovich Netchitaliouk | 2009-10-13 |
| 7393459 | Method for automatic determination of substrates states in plasma processing chambers | Lei Lian, Quentin Ernie Walker | 2008-07-01 |
| 7374696 | Method and apparatus for removing a halogen-containing residue | Mark Kawaguchi, James S. Papanu, Scott Williams | 2008-05-20 |
| 7330244 | Method and apparatus for performing limited area spectral analysis | Lei Lian, Yasuhiro Uo, Michael D. Willwerth, Andrei Ivanovich Netchitaliouk | 2008-02-12 |
| 7306696 | Interferometric endpoint determination in a substrate etching process | Lei Lian | 2007-12-11 |
| 7169625 | Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring | Lei Lian | 2007-01-30 |
| 7158221 | Method and apparatus for performing limited area spectral analysis | Lei Lian, Yasuhiro Uo, Michael D. Willwerth, Andrei Ivanovich Netchitaliouk | 2007-01-02 |
| 6685799 | Variable efficiency faraday shield | Frank Hooshdaran | 2004-02-03 |
| 6485254 | Energy dissipating coupling | — | 2002-11-26 |