Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12204246 | Metal oxide resist patterning with electrical field guided post-exposure bake | Huixiong Dai, Srinivas D. Nemani, Steven Hiloong WELCH, Ellie Yieh, Dmitry Lubomirsky | 2025-01-21 |
| 12085858 | Photoresist patterning process | Huixiong Dai, Srinivas D. Nemani, Steven Hiloong WELCH, Ellie Yieh | 2024-09-10 |
| 11914299 | Lithography process window enhancement for photoresist patterning | Huixiong Dai, Srinivas D. Nemani, Christopher S. Ngai, Ellie Yieh | 2024-02-27 |
| 11880137 | Film structure for electric field guided photoresist patterning process | Huixiong Dai, Srinivas D. Nemani, Ellie Yieh, Steven Hiloong WELCH, Christopher S. Ngai | 2024-01-23 |
| 11650506 | Film structure for electric field guided photoresist patterning process | Huixiong Dai, Christopher S. Ngai, Srinivas D. Nemani, Ellie Yieh, Steven Hiloong WELCH | 2023-05-16 |
| 11609505 | Apparatus and methods for verification and re-use of process fluids | Gautam Pisharody, Lancelot HUANG, Alan Tso, Douglas A. Buchberger, Jr., Huixiong Dai +3 more | 2023-03-21 |
| 11429026 | Lithography process window enhancement for photoresist patterning | Huixiong Dai, Srinivas D. Nemani, Christopher S. Ngai, Ellie Yieh | 2022-08-30 |
| 10429747 | Hybrid laser and implant treatment for overlay error correction | Srinivas D. Nemani, Steve Ghanayem, Ellie Yieh | 2019-10-01 |
| 10234772 | Overlay error correction | Bruce E. Adams, Kelly E. Hollar, Abhilash J. Mayur, Huixiong Dai, Jaujiun Chen | 2019-03-19 |
| 9864280 | Overlay error correction | Bruce E. Adams, Kelly E. Hollar, Abhilash J. Mayur, Huixiong Dai, Jaujiun Chen | 2018-01-09 |
| 9343309 | Lateral oxidation process flows | Liyan Miao, Huixiong Dai | 2016-05-17 |