Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE49488 | Lithography system, method of clamping and wafer table | Michel Pieter Dansberg, Pieter Kruit | 2023-04-11 |
| RE48903 | Apparatus for transferring a substrate in a lithography system | Vincent Sylvester Kuiper, Erwin Slot, Marcel Nicolaas Jacobus van Kervinck, Hendrik Jan De Jong | 2022-01-25 |
| RE48287 | Method for forming an optical fiber array | Ralph Van Melle, Teunis Van De Peut, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks +1 more | 2020-10-27 |
| 10144134 | Enclosure for a target processing machine | Joep Gerard Vijverberg, Laurens Plandsoen, Bas van Gelder, Michel Pieter Dansberg | 2018-12-04 |
| 10054863 | Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such method | Niels Vergeer | 2018-08-21 |
| 9690215 | Interferometer module | Thomas Adrian Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers | 2017-06-27 |
| 9678443 | Lithography system with differential interferometer module | Thomas Adriaan Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers | 2017-06-13 |
| 9665013 | Lithography system, method of clamping and wafer table | Michel Pieter Dansberg, Pieter Kruit | 2017-05-30 |
| 9645511 | Lithography system, method of clamping and wafer table | Michel Pieter Dansberg, Pieter Kruit | 2017-05-09 |
| 9575418 | Apparatus for transferring a substrate in a lithography system | Vincent Sylvester Kuiper, Erwin Slot, Marcel Nicolaas Jacobus van Kervinck, Hendrik Jan De Jong | 2017-02-21 |
| 9507629 | Network architecture and protocol for cluster of lithography machines | Marcel Nicolaas Jacobus van Kervinck | 2016-11-29 |
| 9457549 | Method for forming an optical fiber array | Ralph Van Melle, Teunis Van De Peut, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks +1 more | 2016-10-04 |
| 9395635 | Position determination in a lithography system using a substrate having a partially reflective position mark | Niels Vergeer | 2016-07-19 |
| 9395636 | Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer | Niels Vergeer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg | 2016-07-19 |
| 9383662 | Lithography system for processing at least a part of a target | Niels Vergeer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg | 2016-07-05 |
| 9362084 | Electro-optical element for multiple beam alignment | Alrik van den Brom, Stijn Willem Herman Karel Steenbrink, Marco Jan-Jaco Wieland, Pieter Kappelhof | 2016-06-07 |
| 9261800 | Alignment of an interferometer module for use in an exposure tool | Thomas Adriaan Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers | 2016-02-16 |
| 9201315 | Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system | Niels Vergeer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg | 2015-12-01 |
| 9176397 | Apparatus for transferring a substrate in a lithography system | Vincent Sylvester Kuiper, Erwin Slot, Marcel Nicolaas Jacobus van Kervinck, Hendrik Jan De Jong | 2015-11-03 |
| 9086912 | Network architecture and protocol for cluster of lithography machines | Marcel Nicolaas Jacobus van Kervinck | 2015-07-21 |
| 9082584 | Charged particle beam lithography system and target positioning device | Jerry Johannes Martinus Peijster | 2015-07-14 |
| 9069265 | Interferometer module | Thomas Adrian Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers | 2015-06-30 |
| 9036962 | Arrangement of optical fibers, and a method of forming such arrangement | Ralph Van Melle, Teunis Van De Peut, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks +1 more | 2015-05-19 |
| 9009631 | Lithography system and method for storing positional data of a target | Alexius Otto Looije, Michel Pieter Dansberg, Marcel Nicolaas Jacobus van Kervinck | 2015-04-14 |
| 8957395 | Charged particle beam lithography system and target positioning device | Jerry Johannes Martinus Peijster | 2015-02-17 |