EN

Eiichi Nishimura

TL Tokyo Electron Limited: 80 patents #18 of 5,567Top 1%
OC Oki Electric Industry Co.: 7 patents #247 of 2,807Top 9%
HI Hitachi: 5 patents #7,555 of 28,497Top 30%
TL Tokyo Electron Yamanashi Limited: 4 patents #7 of 138Top 6%
KT Kabushiki Kaisha Toshiba: 2 patents #9,982 of 21,451Top 50%
NC Nippon Paint Holdings Co.: 1 patents #415 of 834Top 50%
MU Murakami: 1 patents #68 of 147Top 50%
TU Tohoku University: 1 patents #615 of 1,680Top 40%
📍 Rifu, MA: #1 of 7 inventorsTop 15%
Overall (All Time): #16,866 of 4,157,543Top 1%
93
Patents All Time

Issued Patents All Time

Showing 26–50 of 93 patents

Patent #TitleCo-InventorsDate
8993352 Plasma processing method and plasma processing apparatus Tadashi Kotsugi, Takashi Sone 2015-03-31
8961737 Plasma processing apparatus 2015-02-24
8961805 Dry etching method for metal film Takashi Sone 2015-02-24
8962489 Method for etching film containing cobalt and palladium Masato Kushibiki 2015-02-24
8877081 Etching method and etching apparatus Tadashi Kotsugi, Fumiko Yamashita 2014-11-04
8815495 Pattern forming method and manufacturing method of semiconductor device Masato Kushibiki 2014-08-26
8778206 Substrate processing method and storage medium Takashi Sone, Fumiko Yamashita 2014-07-15
8772172 Semiconductor device manufacturing method and plasma etching apparatus Masato Kushibiki 2014-07-08
8741396 Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film, method for manufacturing semiconductor device, and storage medium in which control program is stored Hiraku Ishikawa 2014-06-03
8715520 Substrate processing method and storage medium Takashi Sone 2014-05-06
8679985 Dry etching method for silicon nitride film Yusuke Shimizu 2014-03-25
8642136 Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition process Masato Kushibiki, Akitaka Shimizu 2014-02-04
8608974 Substrate processing method 2013-12-17
8585831 Substrate cleaning method Hidefumi Matsui, Tsuyoshi Moriya, Shinichi Kawaguchi, Jun Yamawaku, Kunio Miyauchi 2013-11-19
8551289 Plasma processing apparatus Shimao Yoneyama 2013-10-08
8530354 Substrate processing method Masato Kushibiki 2013-09-10
8518828 Semiconductor device fabrication method Tetsuo Endoh 2013-08-27
8491804 Substrate processing method Masato Kushibiki 2013-07-23
8491805 Semiconductor device manufacturing method and plasma etching apparatus Masato Kushibiki 2013-07-23
8383517 Substrate processing method and substrate processing apparatus Chie Kato, Akitaka Shimizu, Hiroyuki Takahashi 2013-02-26
8383521 Substrate processing method Masato Kushibiki, Fumiko Yamashita 2013-02-26
8377721 Substrate processing system and method Tsuyoshi Shibata 2013-02-19
8357615 Method of manufacturing semiconductor device Yuki Chiba, Ryuichi Asako 2013-01-22
8353986 Substrate processing apparatus Yoshiaki Sasaski, Yusuke Muraki, Yuko Ono 2013-01-15
8329050 Substrate processing method Takashi Sone 2012-12-11