CD

Colin John Dickinson

Applied Materials: 19 patents #694 of 7,310Top 10%
TL The Boc Group Limited: 3 patents #118 of 612Top 20%
Overall (All Time): #181,395 of 4,157,543Top 5%
23
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12183559 Apparatus for temperature control in a substrate processing chamber Vishwas Kumar Pandey, Dinkesh HUDERI SOMANNA, Ala Moradian, Kartik Shah 2024-12-31
12170192 Plasma abatement system utilizing water vapor and oxygen reagent 2024-12-17
11185815 Plasma abatement of compounds containing heavy atoms Michael S. Cox, Monique McIntosh, Paul Fisher, Yutaka Tanaka, Zheng Yuan 2021-11-30
11110392 Apparatus for treating exhaust gas in a processing system Mehran Moalem, Daniel O. Clark 2021-09-07
10920315 Plasma foreline thermal reactor system 2021-02-16
10722840 Methods for treating exhaust gas in a processing system Mehran Moalem, Daniel O. Clark 2020-07-28
10685818 Plasma abatement technology utilizing water vapor and oxygen reagent 2020-06-16
10625312 Plasma abatement solids avoidance by use of oxygen plasma cleaning cycle 2020-04-21
10449486 Plasma abatement of compounds containing heavy atoms Michael S. Cox, Monique McIntosh, Paul Fisher, Yutaka Tanaka, Zheng Yuan 2019-10-22
10176973 Method of cooling a composition using a hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system Michael S. Cox, Rongping Wang, Brian T. West, Roger M. Johnson 2019-01-08
10115571 Reagent delivery system freeze prevention heat exchanger 2018-10-30
9867238 Apparatus for treating an exhaust gas in a foreline Michael S. Cox 2018-01-09
9649592 Plasma abatement of compounds containing heavy atoms Michael S. Cox, Monique McIntosh, Paul Fisher, Yutaka Tanaka, Zheng Yuan 2017-05-16
9597634 Methods and apparatus for treating exhaust gas in a processing system Mehran Moalem, Daniel O. Clark 2017-03-21
9552967 Abatement system having a plasma source Michael S. Cox, Rongping Wang, Brian T. West, Roger M. Johnson 2017-01-24
9543124 Capacitively coupled plasma source for abating compounds produced in semiconductor processes Michael S. Cox, Rongping Wang, Brian T. West, Roger M. Johnson 2017-01-10
9240308 Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system Michael S. Cox, Rongping Wang, Brian T. West, Roger M. Johnson 2016-01-19
9230780 Hall effect enhanced capacitively coupled plasma source Michael S. Cox, Rongping Wang, Brian T. West, Roger M. Johnson 2016-01-05
8747762 Methods and apparatus for treating exhaust gas in a processing system Mehran Moalem, Daniel O. Clark 2014-06-10
8053034 High performance tank systems Penny Dickinson, Robert N. Mundell, Michael A. Maddux, Jess Noble 2011-11-08
6890414 Purification system and method Ray Carnahan 2005-05-10
6701972 Vacuum load lock, system including vacuum load lock, and associated methods Daimhin Paul Murphy 2004-03-09
6569307 Object plating method and system Olivier Blachier, Frank Jansen, Peter M. Pozniak 2003-05-27