| 8349728 |
Method of fabricating copper damascene and dual damascene interconnect wiring |
Jeffrey P. Gambino, William R. Hill, Kenneth E. McAvey, Jr., Thomas L. McDevitt, Anthony K. Stamper +1 more |
2013-01-08 |
| 8288281 |
Method for reducing amine based contaminants |
Xiaomeng Chen, William J. Cote, Anthony K. Stamper |
2012-10-16 |
| 8242544 |
Semiconductor structure having reduced amine-based contaminants |
Xiaomeng Chen, William J. Cote, Anthony K. Stamper |
2012-08-14 |
| 8106513 |
Copper damascene and dual damascene interconnect wiring |
Jeffrey P. Gambino, William R. Hill, Kenneth E. McAvey, Jr., Thomas L. McDevitt, Anthony K. Stamper +1 more |
2012-01-31 |
| 7803708 |
Method for reducing amine based contaminants |
Xiaomeng Chen, William J. Cote, Anthony K. Stamper |
2010-09-28 |
| 7678683 |
Method of fabricating copper damascene and dual damascene interconnect wiring |
Jeffrey P. Gambino, William R. Hill, Kenneth E. McAvey, Jr., Thomas L. McDevitt, Anthony K. Stamper +1 more |
2010-03-16 |
| 7176119 |
Method of fabricating copper damascene and dual damascene interconnect wiring |
Jeffrey P. Gambino, William R. Hill, Kenneth F. McAvey, Jr., Thomas L. McDevitt, Anthony K. Stamper +1 more |
2007-02-13 |
| 7153776 |
Method for reducing amine based contaminants |
Xiaomeng Chen, William J. Cote, Anthony K. Stamper |
2006-12-26 |
| 6528219 |
Dynamic alignment scheme for a photolithography system |
Edward W. Conrad, Paul D. Sonntag |
2003-03-04 |
| 6207333 |
Mask with attenuating phase-shift and opaque regions |
William J. Adair, James J. Colelli, Erik Puttlitz, Timothy J. Toth |
2001-03-27 |
| 5498313 |
Symmetrical etching ring with gas control |
Michael Edward Bailey, Dinh Dang, James G. Michael, Timothy E. Neary, Paul W. Pastel +1 more |
1996-03-12 |
