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Fabrication of gate-all-around integrated circuit structures having pre-spacer deposition cut gates |
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Integrated circuit structures having metal gates with tapered plugs |
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Integrated circuit structures with backside gate partial cut or trench contact partial cut |
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High aspect ratio source or drain structures with abrupt dopant profile |
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Localized spacer for nanowire transistors and methods of fabrication |
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Fabrication of gate-all-around integrated circuit structures having pre-spacer deposition cut gates |
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High aspect ratio source or drain structures with abrupt dopant profile |
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