GC

Giuseppe Curello

IN Intel: 14 patents #2,910 of 30,777Top 10%
Infineon Technologies Ag: 2 patents #3,160 of 7,486Top 45%
Overall (All Time): #296,270 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10332871 Area-efficient and robust electrostatic discharge circuit Christian Russ, Tomasz Biedrzycki, Franz Kuttner, Luis-Felipe Giles, Bernhard Stein 2019-06-25
8741720 Penetrating implant for forming a semiconductor device Ian R. Post, Nick Lindert, Walid M. Hafez, Chia-Hong Jan, Mark Bohr 2014-06-03
8426927 Penetrating implant for forming a semiconductor device Ian R. Post, Nick Lindert, Walid M. Hafez, Chia-Hong Jan, Mark Bohr 2013-04-23
8174060 Selective spacer formation on transistors of different classes on the same device Ian R. Post, Chia-Hong Jan, Mark Bohr 2012-05-08
8154067 Selective spacer formation on transistors of different classes on the same device Ian R. Post, Chia-Hong Jan, Mark Bohr 2012-04-10
7943468 Penetrating implant for forming a semiconductor device Ian R. Post, Nick Lindert, Walid M. Hafez, Chia-Hong Jan, Mark Bohr 2011-05-17
7560780 Active region spacer for semiconductor devices and method to form the same Ian R. Post, Chia-Hong Jan, Sunit Tyagi, Mark Bohr 2009-07-14
7541239 Selective spacer formation on transistors of different classes on the same device Ian R. Post, Chia-Hong Jan, Mark Bohr 2009-06-02
7482670 Enhancing strained device performance by use of multi narrow section layout Thomas Hoffmann, Mark Armstrong 2009-01-27
7422950 Strained silicon MOS device with box layer between the source and drain regions Hemant Deshpande, Sunit Tyagi, Mark Bohr 2008-09-09
7335959 Device with stepped source/drain region profile Bernhard Sell, Sunit Tyagi, Chris Auth 2008-02-26
7129533 High concentration indium fluorine retrograde wells Cory E. Weber, Mark Armstrong, Stephen M. Cea, Sing-Chung Hu, Aaron D. Lilak +1 more 2006-10-31
7101765 Enhancing strained device performance by use of multi narrow section layout Thomas Hoffmann, Mark Armstrong 2006-09-05
7078325 Process for producing a doped semiconductor substrate Jurgen Faul 2006-07-18
6838329 High concentration indium fluorine retrograde wells Cory E. Weber, Mark Armstrong, Stephen M. Cea, Sing-Chung Hu, Aaron D. Lilak +1 more 2005-01-04
6503844 Notched gate configuration for high performance integrated circuits — 2003-01-07