Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10332871 | Area-efficient and robust electrostatic discharge circuit | Christian Russ, Tomasz Biedrzycki, Franz Kuttner, Luis-Felipe Giles, Bernhard Stein | 2019-06-25 |
| 8741720 | Penetrating implant for forming a semiconductor device | Ian R. Post, Nick Lindert, Walid M. Hafez, Chia-Hong Jan, Mark Bohr | 2014-06-03 |
| 8426927 | Penetrating implant for forming a semiconductor device | Ian R. Post, Nick Lindert, Walid M. Hafez, Chia-Hong Jan, Mark Bohr | 2013-04-23 |
| 8174060 | Selective spacer formation on transistors of different classes on the same device | Ian R. Post, Chia-Hong Jan, Mark Bohr | 2012-05-08 |
| 8154067 | Selective spacer formation on transistors of different classes on the same device | Ian R. Post, Chia-Hong Jan, Mark Bohr | 2012-04-10 |
| 7943468 | Penetrating implant for forming a semiconductor device | Ian R. Post, Nick Lindert, Walid M. Hafez, Chia-Hong Jan, Mark Bohr | 2011-05-17 |
| 7560780 | Active region spacer for semiconductor devices and method to form the same | Ian R. Post, Chia-Hong Jan, Sunit Tyagi, Mark Bohr | 2009-07-14 |
| 7541239 | Selective spacer formation on transistors of different classes on the same device | Ian R. Post, Chia-Hong Jan, Mark Bohr | 2009-06-02 |
| 7482670 | Enhancing strained device performance by use of multi narrow section layout | Thomas Hoffmann, Mark Armstrong | 2009-01-27 |
| 7422950 | Strained silicon MOS device with box layer between the source and drain regions | Hemant Deshpande, Sunit Tyagi, Mark Bohr | 2008-09-09 |
| 7335959 | Device with stepped source/drain region profile | Bernhard Sell, Sunit Tyagi, Chris Auth | 2008-02-26 |
| 7129533 | High concentration indium fluorine retrograde wells | Cory E. Weber, Mark Armstrong, Stephen M. Cea, Sing-Chung Hu, Aaron D. Lilak +1 more | 2006-10-31 |
| 7101765 | Enhancing strained device performance by use of multi narrow section layout | Thomas Hoffmann, Mark Armstrong | 2006-09-05 |
| 7078325 | Process for producing a doped semiconductor substrate | Jurgen Faul | 2006-07-18 |
| 6838329 | High concentration indium fluorine retrograde wells | Cory E. Weber, Mark Armstrong, Stephen M. Cea, Sing-Chung Hu, Aaron D. Lilak +1 more | 2005-01-04 |
| 6503844 | Notched gate configuration for high performance integrated circuits | — | 2003-01-07 |