Issued Patents All Time
Showing 251–275 of 534 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8692335 | Source/drain region, contact hole and method for forming the same | Haizhou Yin, Zhijiong Luo | 2014-04-08 |
| 8685760 | Contact resistance test structure and method suitable for three-dimensional integrated circuits | — | 2014-04-01 |
| 8673701 | Semiconductor structure and method for manufacturing the same | Qingqing Liang, Zhijiong Luo, Haizhou Yin | 2014-03-18 |
| 8674515 | 3D integrated circuits structure | Mukta G. Farooq, Subramanian S. Iyer, Steven J. Koester | 2014-03-18 |
| 8674449 | Semiconductor device and method for manufacturing the same | Zhijiong Luo, Haizhou Yin | 2014-03-18 |
| 8673704 | FinFET and method for manufacturing the same | Wei He, Qingqing Liang, Haizhou Yin, Zhijiong Luo | 2014-03-18 |
| 8669155 | Hybrid channel semiconductor device and method for forming the same | Haizhou Yin, Zhijiong Luo | 2014-03-11 |
| 8669160 | Method for manufacturing a semiconductor device | Haizhou Yin, Zhijiong Luo, Da Yang | 2014-03-11 |
| 8669145 | Method and structure for strained FinFET devices | Bruce B. Doris, Diane C. Boyd | 2014-03-11 |
| 8664091 | Method for removing metallic nanotube | Zhijiong Luo, Haizhou Yin | 2014-03-04 |
| 8664054 | Method for forming semiconductor structure | Haizhou Yin, Zhijiong Luo | 2014-03-04 |
| 8658485 | Semiconductor device and method of fabricating the same | Zhijiong Luo, Haizhou Yin | 2014-02-25 |
| 8658507 | MOSFET structure and method of fabricating the same using replacement channel layer | Haizhou Yin, Zhijiong Luo, Qingqing Liang | 2014-02-25 |
| 8643119 | Substantially L-shaped silicide for contact | Zhijiong Luo, Yung Fu Chong, Hung Y. Ng, Kern Rim, Nivo Rovedo | 2014-02-04 |
| 8642471 | Semiconductor structure and method for manufacturing the same | Haizhou Yin, Jun Luo, Zhijiong Luo | 2014-02-04 |
| 8637935 | Semiconductor device including embedded isolation regions and method for forming the same | Huicai Zhong, Qingqing Liang, Haizhou Yin | 2014-01-28 |
| 8633522 | Semiconductor structure and method for fabricating the same | Haizhou Yin, Zhijiong Luo, Huicai Zhong | 2014-01-21 |
| 8629017 | Structure and method to form EDRAM on SOI substrate | Chengwen Pei, Kangguo Cheng, Herbert L. Ho, Subramanian S. Iyer, Byeong Y. Kim +1 more | 2014-01-14 |
| 8629501 | Stress-generating structure for semiconductor-on-insulator devices | Brian J. Greene, Dureseti Chidambarrao, Gregory G. Freeman | 2014-01-14 |
| 8624315 | Field effect transistor having an asymmetric gate electrode | Qingqing Liang | 2014-01-07 |
| 8610275 | Semiconductor contact structure including a spacer formed within a via and method of manufacturing the same | Haizhou Yin, Zhijiong Luo | 2013-12-17 |
| 8598666 | Semiconductor structure and method for manufacturing the same | Haizhou Yin, Zhijiong Luo | 2013-12-03 |
| 8598662 | Semiconductor device and method for forming the same | Qingqing Liang, Zhijiong Luo, Haizhou Yin | 2013-12-03 |
| 8598595 | Semiconductor device and method for manufacturing the same | Zhijiong Luo, Haizhou Yin | 2013-12-03 |
| 8592946 | Lithography for printing constant line width features | — | 2013-11-26 |