LF

Lisa A. Fanti

IBM: 11 patents #9,995 of 70,183Top 15%
📍 Hopewell Junction, NY: #157 of 648 inventorsTop 25%
🗺 New York: #13,384 of 115,490 inventorsTop 15%
Overall (All Time): #469,042 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
7572726 Method of forming a bond pad on an I/C chip and resulting structure Julie C. Biggs, Tien-Jen Cheng, David E. Eichstadt, Jonathan H. Griffith, Randolph F. Knarr +6 more 2009-08-11
6995475 I/C chip suitable for wire bonding Julie C. Biggs, Tien-Jen Cheng, David E. Eichstadt, Jonathan H. Griffith, Randolph F. Knarr +6 more 2006-02-07
6900142 Inhibition of tin oxide formation in lead free interconnect formation Emanual I. Cooper, John M. Cotte, David E. Eichstadt, Stephen Kilpatrick, Henry A. Nye, III +1 more 2005-05-31
6622907 Sacrificial seed layer process for forming C4 solder bumps Randolph F. Knarr, Erik J. Roggeman, Kamalesh K. Srivastava 2003-09-23
6468413 Electrochemical etch for high tin solder bumps John M. Cotte, David E. Eichstadt 2002-10-22
6258627 Underfill preform interposer for joining chip to substrate Joseph A. Benenati, William T. Chen, Wayne J. Howell, John U. Knickerbocker 2001-07-10
6130170 Process improvements for titanium-tungsten etching in the presence of electroplated C4's Lawrence D. David 2000-10-10
6015505 Process improvements for titanium-tungsten etching in the presence of electroplated C4's Lawrence D. David 2000-01-18
5935402 Process for stabilizing organic additives in electroplating of copper 1999-08-10
5908540 Copper anode assembly for stabilizing organic additives in electroplating of copper 1999-06-01
5904156 Dry film resist removal in the presence of electroplated C4's Gerald G. Advocate, Jr., Henry A. Nye, III 1999-05-18