Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6561220 | Apparatus and method for increasing throughput in fluid processing | Wayne M. Moreau, John P. Simons, Charles J. Taft, John M. Cotte | 2003-05-13 |
| 6558475 | Process for cleaning a workpiece using supercritical carbon dioxide | Jesse Jur, Wayne M. Moreau, John P. Simons, Charles J. Taft | 2003-05-06 |
| 6509136 | Process of drying a cast polymeric film disposed on a workpiece | Dario L. Goldfarb, David R. Medeiros, Wayne M. Moreau, John P. Simons, Charles J. Taft | 2003-01-21 |
| 6457480 | Process and apparatus for cleaning filters | John M. Cotte, Wayne M. Moreau, Keith R. Pope, John P. Simons, Charles J. Taft | 2002-10-01 |
| 6454869 | Process of cleaning semiconductor processing, handling and manufacturing equipment | John M. Cotte, Dario L. Goldfarb, Wayne M. Moreau, Keith R. Pope, John P. Simons +1 more | 2002-09-24 |
| 6451375 | Process for depositing a film on a nanometer structure | John M. Cotte, Wayne M. Moreau, John P. Simons, Charles J. Taft | 2002-09-17 |
| 6425956 | Process for removing chemical mechanical polishing residual slurry | John M. Cotte, Donald J. Delehanty, Wayne M. Moreau, John P. Simons, Charles J. Taft +1 more | 2002-07-30 |
| 6398875 | Process of drying semiconductor wafers using liquid or supercritical carbon dioxide | John M. Cotte, Dario L. Goldfarb, Wayne M. Moreau, Keith R. Pope, John P. Simons +1 more | 2002-06-04 |
| 6346484 | Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures | John M. Cotte, Christopher V. Jahnes, Wayne M. Moreau, Satyanarayana V. Nitta, Katherine L. Saenger +1 more | 2002-02-12 |
| 6254796 | Selective etching of silicate | David L. Rath, Glenn W. Gale, Rangarajan Jagannathan, Karen P. Madden, Harald Okorn-Schmidt +1 more | 2001-07-03 |
| 6200891 | Removal of dielectric oxides | Rangarajan Jagannathan, Karen P. Madden, Harald Okorn-Schmidt, Keith R. Pope, David L. Rath | 2001-03-13 |
| 6150282 | Selective removal of etching residues | David L. Rath, Rangarajan Jagannathan, Harald Okorn-Schmidt, Karen P. Madden, Keith R. Pope | 2000-11-21 |
| 6117796 | Removal of silicon oxide | Glenn W. Gale, Rangarajan Jagannathan, Karen P. Madden, Harald Okorn-Schmidt, Keith R. Pope +1 more | 2000-09-12 |
| 6066267 | Etching of silicon nitride | David L. Rath, Rangarajan Jagannathan, Harald Okorn-Schmidt, Karen P. Madden, Keith R. Pope | 2000-05-23 |
| 6033996 | Process for removing etching residues, etching mask and silicon nitride and/or silicon dioxide | David L. Rath, Rangarajan Jagannathan, Harald Okorn-Schmidt, Karen P. Madden, Keith R. Pope | 2000-03-07 |
| 5976264 | Removal of fluorine or chlorine residue by liquid CO.sub.2 | Robert J. Purtell, Laura Rothman, Jin J. Wu | 1999-11-02 |
| 5965465 | Etching of silicon nitride | David L. Rath, Rangarajan Jagannathan, Harald Okorn-Schmidt, Karen P. Madden, Keith R. Pope | 1999-10-12 |
| 5908510 | Residue removal by supercritical fluids | Robert J. Purtell, Laura Rothman, Jin J. Wu | 1999-06-01 |
| 5780363 | Etching composition and use thereof | Donald J. Delehanty, Rangarajan Jagannathan, Donna Diane Miura, George F. Ouimet, David L. Rath +2 more | 1998-07-14 |