Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4732646 | Method of forming identically positioned alignment marks on opposite sides of a semiconductor wafer | Gerhard Elsner, Holger Hinkel | 1988-03-22 |
| 4642163 | Method of making adhesive metal layers on substrates of synthetic material and device produced thereby | Friedrich W. Schwerdt, Hans-Joachim Trumpp | 1987-02-10 |
| 4591540 | Method of transferring a pattern into a radiation-sensitive layer | Harald Bohlen, Erwin Bretscher, Helmut Engelke, Peter Nehmiz, Peter Vettiger | 1986-05-27 |
| 4589952 | Method of making trenches with substantially vertical sidewalls in silicon through reactive ion etching | Uwe Behringer, Hans-Joachim Trumpp | 1986-05-20 |
| 4556628 | Process for producing printed circuit boards with metallic conductor structures embedded in the insulating substrate | Friedrich W. Schwerdt, Hans-Joachim Trumpp | 1985-12-03 |
| 4522893 | Contact device for releasably connecting electrical components | Harald Bohlen, Gerhard Kaus, Joachim Keyser, Werner Kulcke | 1985-06-11 |
| 4520314 | Probe head arrangement for conductor line testing with at least one probe head comprising a plurality of resilient contacts | Karl Asch, Michael Kallmeyer, Werner Kulcke | 1985-05-28 |
| 4513203 | Mask and system for mutually aligning objects in ray exposure systems | Harald Bohlen, Helmut Engelke, Reinhold Muhl, Peter Nehmiz, Hans-Joachim Trumpp | 1985-04-23 |
| 4504558 | Method of compensating the proximity effect in electron beam projection systems | Harald Bohlen, Helmut Engelke, Peter Nehmiz | 1985-03-12 |
| 4502914 | Method of making structures with dimensions in the sub-micrometer range | Hans-Joachim Trumpp | 1985-03-05 |
| 4448865 | Shadow projection mask for ion implantation and ion beam lithography | Harald Bohlen, Peter Nehmiz | 1984-05-15 |
| 4426584 | Method of compensating the proximity effect in electron beam projection systems | Harald Bohlen, Helmut Engelke, Peter Nehmiz | 1984-01-17 |
| 4417946 | Method of making mask for structuring surface areas | Harald Bohlen, Helmut Engelke, Peter Nehmiz | 1983-11-29 |
| 4393127 | Structure with a silicon body having through openings | Georg Kraus, Gerhard Schmid | 1983-07-12 |
| 4370554 | Alignment system for particle beam lithography | Harald Bohlen, Werner Kulcke, Peter Nehmiz | 1983-01-25 |
| 4342817 | Mask for structuring surface areas, and method of making it | Harald Bohlen, Helmut Engelke, Peter Nehmiz | 1982-08-03 |
| 4334156 | Method of shadow printing exposure | Harald Bohlen, Helmut Engelke, Werner Kulcke, Peter Nehmiz | 1982-06-08 |
| 4267259 | Exposure process | Harald Bohlen, Werner Kulcke, Peter Nehmiz | 1981-05-12 |