| 4591540 |
Method of transferring a pattern into a radiation-sensitive layer |
Erwin Bretscher, Helmut Engelke, Peter Nehmiz, Peter Vettiger, Johann Greschner |
1986-05-27 |
| 4578587 |
Error-corrected corpuscular beam lithography |
Uwe Behringer, Peter Nehmiz, Werner Zapka |
1986-03-25 |
| 4554458 |
Electron beam projection lithography |
Uwe Behringer, Werner Kulcke, Peter Nehmiz |
1985-11-19 |
| 4522893 |
Contact device for releasably connecting electrical components |
Gerhard Kaus, Johann Greschner, Joachim Keyser, Werner Kulcke |
1985-06-11 |
| 4513203 |
Mask and system for mutually aligning objects in ray exposure systems |
Helmut Engelke, Johann Greschner, Reinhold Muhl, Peter Nehmiz, Hans-Joachim Trumpp |
1985-04-23 |
| 4504558 |
Method of compensating the proximity effect in electron beam projection systems |
Helmut Engelke, Johann Greschner, Peter Nehmiz |
1985-03-12 |
| 4448865 |
Shadow projection mask for ion implantation and ion beam lithography |
Johann Greschner, Peter Nehmiz |
1984-05-15 |
| 4426584 |
Method of compensating the proximity effect in electron beam projection systems |
Helmut Engelke, Johann Greschner, Peter Nehmiz |
1984-01-17 |
| 4417946 |
Method of making mask for structuring surface areas |
Helmut Engelke, Johann Greschner, Peter Nehmiz |
1983-11-29 |
| 4370554 |
Alignment system for particle beam lithography |
Johann Greschner, Werner Kulcke, Peter Nehmiz |
1983-01-25 |
| 4342817 |
Mask for structuring surface areas, and method of making it |
Helmut Engelke, Johann Greschner, Peter Nehmiz |
1982-08-03 |
| 4334156 |
Method of shadow printing exposure |
Helmut Engelke, Werner Kulcke, Peter Nehmiz, Johann Greschner |
1982-06-08 |
| 4267259 |
Exposure process |
Johann Greschner, Werner Kulcke, Peter Nehmiz |
1981-05-12 |
