GK

Georg Kraus

IBM: 15 patents #7,450 of 70,183Top 15%
FS Fichtel & Sachs: 5 patents #50 of 388Top 15%
KG Karl Mayer Textilmaschinenfabrik Gmbh: 1 patents #35 of 75Top 50%
MA Mannesmann Sachs Ag: 1 patents #156 of 301Top 55%
TG Tenneco Gmbh: 1 patents #86 of 205Top 45%
Overall (All Time): #184,382 of 4,157,543Top 5%
23
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9989184 Fitting for an exhaust pipe Martin Weisenburger, Pascal Galivel 2018-06-05
5979628 Elastic wear indicator for a friction clutch Jorg Lampe, Thomas Stretz, Michael Weiss, Reinhold Weidinger, Klaus Gorzitzke 1999-11-09
5658472 Method for producing deep vertical structures in silicon substrates Johann W. Bartha, Johann Greschner, Robert Junginger 1997-08-19
5622087 Dual-mass flywheel Bernhard Schierling, Hilmar Gobel, Bernd Stockmann 1997-04-22
5575183 Dual-mass flywheel Bernhard Schierling, Hilmar Gobel, Bernd Stockmann 1996-11-19
5575182 Dual-mass flywheel Bernhard Schierling, Hilmar Gobel, Bernd Stockmann 1996-11-19
5380248 Torsional shock absorber Bernhard Schierling 1995-01-10
5375435 Process and apparatus for controlling thread feed in a warp knitting machine Friedrich Gille 1994-12-27
5321878 Method for removing a motor vehicle friction clutch Bernhard Schierling 1994-06-21
5162133 Process for fabricating silicon carbide films with a predetermined stress Johann W. Bartha, Thomas Bayer, Johann Greschner, Olaf Wolter 1992-11-10
5116462 Method of producing micromechanical sensors for the AFM/STM profilometry Johann W. Bartha, Thomas Bayer, Johann Greschner, Helga Weiss, Olaf Wolter 1992-05-26
5051379 Method of producing micromechanical sensors for the AFM/STM profilometry and micromechanical AFM/STM sensor head Thomas Bayer, Johann Greschner, Helga Weiss, Olaf Wolter 1991-09-24
4969415 PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides Johann W. Bartha, Thomas Bayer, Johann Greschner, Gerhard Schmid 1990-11-13
4918033 PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides Johann W. Bartha, Thomas Bayer, Johann Greschner, Gerhard Schmid 1990-04-17
4583145 Apparatus comprising a lubricant-coated magnetic disc and a magnetic head, and method of making said apparatus Annelie Monnich, Michael Glatzel, Holger Hinkel, Gerhard Kaus, Ulrich Kunzel +1 more 1986-04-15
4569743 Method and apparatus for the selective, self-aligned deposition of metal layers Thomas Bayer, Ulrich Kuenzel, Gisela Renz, Rolf Schaefer 1986-02-11
4557796 Method of dry copper etching and its implementation Frank Druschke, Ulrich Kuenzel, Wolf-Dieter Ruh, Rolf Schaefer 1985-12-10
4461237 Plasma reactor for etching and coating substrates Holger Hinkel, Gerhard Kaus, Ulrich Kunzel, Reinhold Muehl 1984-07-24
4424102 Reactor for reactive ion etching and etching method Christine Brandeis, Jurgen Kempf, Ulrich Ku/ nzel 1984-01-03
4415942 Magnetic disk substrate of fiber-reinforced plastic Albert Frosch, Holger Hinkel 1983-11-15
4393127 Structure with a silicon body having through openings Johann Greschner, Gerhard Schmid 1983-07-12
4386968 Method of making semiconductor device structures by means of ion implantation under a partial pressure of oxygen Holger Hinkel, Jurgen Kempf, Gerhard Schmid 1983-06-07
4288716 Ion source having improved cathode Holger Hinkel 1981-09-08