Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6218264 | Method of producing a calibration standard for 2-D and 3-D profilometry in the sub-nanometer range | Thomas Bayer, Johann Greschner, Martin Nonnenmacher, deceased, Helga Weiss | 2001-04-17 |
| 6061074 | Ion generator for ionographic print heads | Frank Druschke, Gerhard Elsner, Johann Greschner | 2000-05-09 |
| 5960255 | Calibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing it | Thomas Bayer, Johann Greschner, Martin Nonnenmacher, deceased, Helga Weiss | 1999-09-28 |
| 5791959 | Method of fabricating a field emission device | Johann Greschner, Volkhard Wolf | 1998-08-11 |
| 5717278 | Field emission device and method for fabricating it | Johann Greschner, Volkhard Wolf | 1998-02-10 |
| 5707537 | Bulk removal, transport and storage fixture for small batch-fabricated devices | Johann Greschner, Klaus Meissner, Volkhard Wolf | 1998-01-13 |
| 5665905 | Calibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing it | Thomas Bayer, Johann Greschner, Martin Nonnenmacher, deceased, Helga Weiss | 1997-09-09 |
| 5658472 | Method for producing deep vertical structures in silicon substrates | Johann Greschner, Robert Junginger, Georg Kraus | 1997-08-19 |
| 5641610 | Method for producing a multi-step structure in a substrate | Johann Greschner, Karl Probst, Gerhard Schmid | 1997-06-24 |
| 5635337 | Method for producing a multi-step structure in a substrate | Johann Greschner, Karl Probst, Gerhard Schmid | 1997-06-03 |
| 5534359 | Calibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing it | Thomas Bayer, Johann Greschner, Martin Nonnenmacher, deceased, Helga Weiss | 1996-07-09 |
| 5304278 | Apparatus for plasma or reactive ion etching and method of etching substrates having a low thermal conductivity | Thomas Bayer, Johann Greschner, Dieter Kern, Volker Mattern, Roland Stoehr | 1994-04-19 |
| 5296091 | Method of etching substrates having a low thermal conductivity | Thomas Bayer, Johann Greschner, Dieter Kern, Volker Mattern, Roland Stoehr | 1994-03-22 |
| 5162133 | Process for fabricating silicon carbide films with a predetermined stress | Thomas Bayer, Johann Greschner, Georg Kraus, Olaf Wolter | 1992-11-10 |
| 5116462 | Method of producing micromechanical sensors for the AFM/STM profilometry | Thomas Bayer, Johann Greschner, Georg Kraus, Helga Weiss, Olaf Wolter | 1992-05-26 |
| 4969415 | PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides | Thomas Bayer, Johann Greschner, Georg Kraus, Gerhard Schmid | 1990-11-13 |
| 4918033 | PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides | Thomas Bayer, Johann Greschner, Georg Kraus, Gerhard Schmid | 1990-04-17 |
| 4871418 | Process for fabricating arbitrarily shaped through holes in a component | Jurgen Wittlinger, Johann Greschner, Thomas Bayer | 1989-10-03 |