JC

Jack O. Chu

IBM: 129 patents #367 of 70,183Top 1%
Globalfoundries: 8 patents #444 of 4,424Top 15%
📍 Manhasset Hills, NY: #1 of 19 inventorsTop 6%
🗺 New York: #292 of 115,490 inventorsTop 1%
Overall (All Time): #7,496 of 4,157,543Top 1%
137
Patents All Time

Issued Patents All Time

Showing 51–75 of 137 patents

Patent #TitleCo-InventorsDate
7704815 Method of creating defect free high Ge content (>25%) SiGe-on-insulator (SGOI) substrates using wafer bonding techniques Michael A. Cobb, Philip A. Saunders, Leathen Shi 2010-04-27
7705345 High performance strained silicon FinFETs device and method for forming same Stephen W. Bedell, Kevin K. Chan, Dureseti Chidambarrao, Silke H. Christianson, Anthony G. Domenicucci +4 more 2010-04-27
7679121 Ultra scalable high speed heterojunction vertical n-channel MISFETs and methods thereof Qiqing C. Ouyang 2010-03-16
7678638 Metal gated ultra short MOSFET devices Bruce B. Doris, Meikei Ieong, Jing Wang 2010-03-16
7652288 Epitaxial and polycrystalline growth of Si1-X-YGEXCY and Si1-YCY alloy layers on Si by UHV-CVD Basanth Jaqannathan, Alfred Grill, Bernard S. Meyerson, John A. Ott 2010-01-26
7608496 High speed GE channel heterostructures for field effect devices 2009-10-27
7569442 High speed lateral heterojunction MISFETS realized by 2-dimensional bandgap engineering and methods thereof Qiqing C. Ouyang 2009-08-04
7563657 High performance FET devices and methods thereof 2009-07-21
7547930 High performance FET devices and methods thereof 2009-06-16
7510916 High performance FET devices and methods thereof 2009-03-31
7510904 Structure for and method of fabricating a high-speed CMOS-compatible Ge-on-insulator photodetector Gabriel Dehlinger, Alfred Grill, Steven J. Koester, Qiqing C. Ouyang, Jeremy D. Schaub 2009-03-31
7507989 Strained Si MOSFET on tensile-strained SiGe-on-insulator (SGOI) Kevin K. Chan, Kern Rim, Leathen Shi 2009-03-24
7494861 Method for metal gated ultra short MOSFET devices Bruce B. Doris, Meikei Ieong, Jing Wang 2009-02-24
7453113 Ultra scalable high speed heterojunction vertical n-channel MISFETs and methods thereof Qiqing C. Ouyang 2008-11-18
7445977 Method of creating defect free high Ge content (> 25%) SiGe-on-insulator (SGOI) substrates using wafer bonding techniques Michael A. Cobb, Philip A. Saunders, Leathen Shi 2008-11-04
7429748 High speed GE channel heterostructures for field effect devices 2008-09-30
7427773 Layer transfer of low defect SiGe using an etch-back process David R. DiMilia, Lijuan Huang 2008-09-23
7411214 High performance FET devices and methods thereof 2008-08-12
7405422 Epitaxial and polycrystalline growth of Si1-x-yGexCy and Si1-yCy alloy layers on Si by UHV-CVD Basanth Jaqannathan, Alfred Grill, Bernard S. Meyerson, John A. Ott 2008-07-29
7393735 Structure for and method of fabricating a high-mobility field-effect transistor Steven J. Koester, Qiqing C. Ouyang 2008-07-01
7387925 Integration of strained Ge into advanced CMOS technology Huiling Shang, Meikei Ieong, Kathryn Guarini 2008-06-17
7358122 High performance FET devices and methods thereof 2008-04-15
7348629 Metal gated ultra short MOSFET devices Bruce B. Doris, Meikei Ieong, Jing Wang 2008-03-25
7244958 Integration of strained Ge into advanced CMOS technology Huiling Shang, Meikei Ieong, Kathryn Guarini 2007-07-17
7235812 Method of creating defect free high Ge content (>25%) SiGe-on-insulator (SGOI) substrates using wafer bonding techniques Michael A. Cobb, Philip A. Saunders, Leathen Shi 2007-06-26