Issued Patents All Time
Showing 26–50 of 85 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9231063 | Boron rich nitride cap for total ionizing dose mitigation in SOI devices | Alfred Grill, Kenneth P. Rodbell | 2016-01-05 |
| 9112068 | Laser doping of crystalline semiconductors using a dopant-containing amorphous silicon stack for dopant source and passivation | Katherine L. Saenger | 2015-08-18 |
| 8895433 | Method of forming a graphene cap for copper interconnect structures | Griselda Bonilla, Christos D. Dimitrakopoulos, Alfred Grill, James B. Hannon, Qinghuang Lin +3 more | 2014-11-25 |
| 8680511 | Bilayer gate dielectric with low equivalent oxide thickness for graphene devices | Christos D. Dimitrakopoulos, Damon B. Farmer, Alfred Grill, Yu-Ming Lin, Dirk Pfeiffer +1 more | 2014-03-25 |
| 8623761 | Method of forming a graphene cap for copper interconnect structures | Griselda Bonilla, Christos D. Dimitrakopoulos, Alfred Grill, James B. Hannon, Qinghuang Lin +3 more | 2014-01-07 |
| 8618663 | Patternable dielectric film structure with improved lithography and method of fabricating same | Qinghuang Lin | 2013-12-31 |
| 8618183 | Materials containing voids with void size controlled on the nanometer scale | Stephen M. Gates, Alfred Grill, Son V. Nguyen, Vishnubhai V. Patel | 2013-12-31 |
| 8604337 | Method to evaluate effectiveness of substrate cleanness and quantity of pin holes in an antireflective coating of a solar cell | John M. Cotte, Laura L. Kosbar, Xiaoyan Shao | 2013-12-10 |
| 8530886 | Nitride gate dielectric for graphene MOSFET | Phaedon Avouris, Wenjuan Zhu | 2013-09-10 |
| 8519260 | Method to evaluate effectiveness of substrate cleanness and quantity of pin holes in an antireflective coating of a solar cell | John M. Cotte, Laura L. Kosbar, Xiaoyan Shao | 2013-08-27 |
| 8461039 | Patternable low-K dielectric interconnect structure with a graded cap layer and method of fabrication | Qinghuang Lin | 2013-06-11 |
| 8455292 | Deposition of germanium film | Solomon Assefa, Pratik P. Joshi | 2013-06-04 |
| 8373271 | Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication | Dario L. Goldfarb, Ranee W. Kwong, Qinghuang Lin, Hosadurga Shobha | 2013-02-12 |
| 8268411 | Materials containing voids with void size controlled on the nanometer scale | Stephen M. Gates, Alfred Grill, Son V. Nguyen, Vishnubhai V. Patel | 2012-09-18 |
| 8202783 | Patternable low-k dielectric interconnect structure with a graded cap layer and method of fabrication | Qinghuang Lin | 2012-06-19 |
| 8101150 | Control of carbon nanotube diameter using CVD or PECVD growth | Alfred Grill, Dinkar Singh | 2012-01-24 |
| 8101236 | Method of fabricating a SiCOH dielectric material with improved toughness and improved Si-C bonding | Daniel C. Edelstein, Stephen M. Gates, Alfred Grill, Michael Lane, Qinghuang Lin +2 more | 2012-01-24 |
| 8097932 | Ultra low κ plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | Son V. Nguyen, Stephen M. Gates, Alfred Grill | 2012-01-17 |
| 7915180 | SiCOH film preparation using precursors with built-in porogen functionality | Stephen M. Gates, Alfred Grill, Robert D. Miller, Son V. Nguyen | 2011-03-29 |
| 7892648 | SiCOH dielectric material with improved toughness and improved Si-C bonding | Daniel C. Edelstein, Stephen M. Gates, Alfred Grill, Michael Lane, Robert D. Miller +1 more | 2011-02-22 |
| 7790566 | Semiconductor surface treatment for epitaxial growth | Jack O. Chu | 2010-09-07 |
| 7745863 | Flip FERAM cell and method to form same | James W. Adkisson, Charles T. Black, Alfred Grill, Randy W. Mann, Wilbur D. Pricer +2 more | 2010-06-29 |
| 7674521 | Materials containing voids with void size controlled on the nanometer scale | Stephen M. Gates, Alfred Grill, Son V. Nguyen, Vishnubhai V. Patel | 2010-03-09 |
| 7628974 | Control of carbon nanotube diameter using CVD or PECVD growth | Alfred Grill, Dinkar Singh | 2009-12-08 |
| 7566938 | Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures | Cyril Cabral, Jr., Alessandro C. Callegari, Michael A. Gribelyuk, Paul C. Jamison, Dianne L. Lacey +4 more | 2009-07-28 |