YH

Yoshio Homma

HI Hitachi: 32 patents #817 of 28,497Top 3%
RT Renesas Technology: 12 patents #178 of 3,337Top 6%
HE Hitachi Vlsi Engineering: 1 patents #390 of 666Top 60%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
Overall (All Time): #65,896 of 4,157,543Top 2%
45
Patents All Time

Issued Patents All Time

Showing 26–45 of 45 patents

Patent #TitleCo-InventorsDate
6458674 Process for manufacturing semiconductor integrated circuit device Naofumi Ohashi, Junji Noguchi, Toshinori Imai, Hizuru Yamaguchi, Nobuo Owada +2 more 2002-10-01
6376345 Process for manufacturing semiconductor integrated circuit device Naofumi Ohashi, Junji Noguchi, Toshinori Imai, Hizuru Yamaguchi, Nobuo Owada +2 more 2002-04-23
6326299 Method for manufacturing a semiconductor device Seiichi Kondo, Noriyuki Sakuma, Naofumi Ohashi, Toshinori Imai, Hizuru Yamaguchi +1 more 2001-12-04
6221773 Method for working semiconductor wafer Kan Yasui, Shigeo Moriyama, Katsuhiko Yamaguchi 2001-04-24
6180020 Polishing method and apparatus Shigeo Moriyama, Katsuhiko Yamaguchi, Sunao Matsubara, Yoshihiro Ishida, Ryousei Kawa-ai 2001-01-30
6117775 Polishing method Seiichi Kondo, Noriyuki Sakuma, Kenichi Takeda, Kenji Hinode 2000-09-12
6043155 Polishing agent and polishing method Kikuo Kusukawa, Shigeo Moriyama, Masayuki Nagasawa 2000-03-28
5772780 Polishing agent and polishing method Kikuo Kusukawa, Shigeo Moriyama, Masayuki Nagasawa 1998-06-30
5609511 Polishing method Shigeo Moriyama, Yoshio Kawamura, Kikuo Kusukawa, Takeshi Furusawa 1997-03-11
5444000 Method of fabricating integrated circuit with improved yield rate Norio Ohkubo, Makoto Suzuki, Katsuro Sasaki 1995-08-22
5270259 Method for fabricating an insulating film from a silicone resin using O.sub . Shinichi Ito, Eiji Sasaki, Natsuki Yokoyama 1993-12-14
5177589 Refractory metal thin film having a particular step coverage factor and ratio of surface roughness Nobuyoshi Kobayashi, Hidekazu Goto, Masayuki Suzuki, Natsuki Yokoyama, Yoshitaka Nakamura 1993-01-05
5175017 Method of forming metal or metal silicide film Nobuyoshi Kobayashi, Hidekazu Goto, Masayuki Suzuki, Natsuki Yokoyama 1992-12-29
4897709 Titanium nitride film in contact hole with large aspect ratio Natsuki Yokoyama, Kenji Hinode, Kiichiro Mukai 1990-01-30
4842891 Method of forming a copper film by chemical vapor deposition Hiroshi Miyazaki, Kiichiro Mukai 1989-06-27
4717462 Sputtering apparatus Sukeyoshi Tsunekawa, Shunji Sasabe 1988-01-05
4710398 Semiconductor device and manufacturing method thereof Takashi Nishida 1987-12-01
4599135 Thin film deposition Sukeyoshi Tsunekawa, Hiroshi Morisaki, Sadayuki Okudaira, Kiichiro Mukai 1986-07-08
4539616 Thin film magnetic head and fabricating method thereof Isamu Yuito, Kazuo Shiiki, Atsushi Saiki, Noriyuki Kumasaka, Yoshihiro Shiroishi +1 more 1985-09-03
4394245 Sputtering apparatus Sukeyoshi Tsunekawa, Hiroshi Morisaki, Seiki Harada 1983-07-19