MY

Masato Yoshida

HC Hitachi Chemical Company: 34 patents #6 of 1,946Top 1%
MM Mitsubishi Motors: 31 patents #14 of 1,823Top 1%
Sumitomo Electric Industries: 9 patents #3,076 of 21,551Top 15%
TC Toppan Printing Co.: 6 patents #114 of 1,467Top 8%
MC Murata Manufacturing Co.: 5 patents #1,480 of 5,295Top 30%
Nsk: 5 patents #309 of 1,559Top 20%
OM Omron: 4 patents #761 of 3,089Top 25%
AD Advantest: 3 patents #330 of 1,193Top 30%
DE Denso: 3 patents #3,857 of 11,792Top 35%
Nichia: 3 patents #567 of 1,531Top 40%
JA Japan Science And Technology Agency: 2 patents #401 of 2,171Top 20%
NU National University Corporation Tohoku University: 2 patents #36 of 170Top 25%
TO Toyota: 2 patents #10,861 of 26,838Top 45%
PA Panasonic: 2 patents #9,678 of 21,108Top 50%
TE Toshiba Elevator: 2 patents #29 of 91Top 35%
JD Japan Display: 1 patents #900 of 1,204Top 75%
SC Sumitomo Bakelite Co.: 1 patents #403 of 790Top 55%
HI Hitachi: 1 patents #17,742 of 28,497Top 65%
TC Taiyo Ink Mfg. Co.: 1 patents #47 of 95Top 50%
HC Higeta Shoyu Co.: 1 patents #13 of 22Top 60%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
YM Yamazaki Mazak: 1 patents #130 of 272Top 50%
Canon: 1 patents #14,899 of 19,416Top 80%
MK Mitsubishi Jidosha Kogya Kabashiki Kaisha: 1 patents #5 of 12Top 45%
MI Minolta: 1 patents #729 of 1,109Top 70%
KT Kabushiki Kaisha Toshiba: 1 patents #13,537 of 21,451Top 65%
JM Japan Steel Works M&E: 1 patents #5 of 15Top 35%
NC Nippon Crucible Co.: 1 patents #17 of 45Top 40%
NO Noritz: 1 patents #135 of 228Top 60%
Overall (All Time): #8,948 of 4,157,543Top 1%
126
Patents All Time

Issued Patents All Time

Showing 51–75 of 126 patents

Patent #TitleCo-InventorsDate
7708788 Cerium oxide abrasive and method of polishing substrates Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more 2010-05-04
7711870 Interface detecting circuit and interface detecting method Yoshihito Kawakami, Shigenori Arai, Hideyuki Kihara 2010-05-04
7602546 Laser oscillator Kazunori Shiota, Shin Masuda, Masataka Nakazawa 2009-10-13
7410409 Abrasive compound for CMP, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive compound Naoyuki Koyama, Kouji Haga, Keizou Hirai, Toranosuke Ashizawa, Youiti Machii 2008-08-12
7404476 Escalator and skirt end structure 2008-07-29
7268525 Buck-boost converter Takuya Ishii, Mikio Motomori, Jun Hara 2007-09-11
7263439 Image operation system 2007-08-28
D535804 Portion of inlet for escalator Yoshio Ogimura, Koji Sugiura, Nobuhiro Oku, Kazuhiko Nakao 2007-01-23
7163644 CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate Toshihiko Akahori, Toranosuke Ashizawa, Keizo Hirai, Miho Kurihara, Yasushi Kurata 2007-01-16
7115021 Abrasive, method of polishing target member and process for producing semiconductor device Toranosuke Ashizawa, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more 2006-10-03
7081741 Multi-output power supply and electronic device using them Takuya Ishii, Takashi Ryu, Mikio Motomori, Hirohisa Tanabe, Kazuhito Kimura +1 more 2006-07-25
7001305 Toroidal type continuously variable transmission Kouji Ishikawa, Takashi Imanishi 2006-02-21
6885475 Name card creating apparatus 2005-04-26
6863700 Cerium oxide abrasive and method of polishing substrates Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more 2005-03-08
6856723 Group velocity dispersion measuring device and group velocity dispersion measuring method Hiromasa Ito, Koichiro Nakamura 2005-02-15
6850318 Polarization mode dispersion measuring device and polarization mode dispersion measuring method Hiromasa Ito, Toshiyuki Miyamoto, Koichiro Nakamura 2005-02-01
6809478 Metal halide lamp for automobile headlight Hideaki Kiryu 2004-10-26
6794724 Module for optical communications for converting light and differential signals Sadao Tanikoshi 2004-09-21
6786945 Polishing compound and method for polishing substrate Youichi Machii, Naoyuki Koyama, Masaya Nishiyama 2004-09-07
6783434 CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate Toshihiko Akahori, Toranosuke Ashizawa, Keizo Hirai, Miho Kurihara, Yasushi Kurata 2004-08-31
6682457 Toroidal type continuously variable transmission Kouji Ishikawa, Takashi Imanishi 2004-01-27
6670780 Method for operating high-pressure discharge lamp, lighting apparatus, and high-pressure discharge lamp apparatus Shunsuke Ono, Masahiro Yamamoto, Minoru Ozasa 2003-12-30
6639343 Mercury-free metal halide lamp Kiyoshi Takahashi, Yuriko Kaneko, Hideaki Kiryu 2003-10-28
6634940 Prize acquisition game machine and it's prize Koki Imai 2003-10-21
6615499 Method for producing cerium oxide, cerium oxide abrasive, method for polishing substrate using the same and method for manufacturing semiconductor device Jun Matsuzawa, Atsushi Sugimoto, Keizou Hirai, Toranosuke Ashizawa, Yuuto Ootsuki 2003-09-09