MN

Masaya Nishiyama

HC Hitachi Chemical Company: 5 patents #314 of 1,946Top 20%
SC Showa Denko Materials Co.: 1 patents #135 of 270Top 50%
Overall (All Time): #822,054 of 4,157,543Top 20%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
10946494 Polishing agent, stock solution for polishing agent, and polishing method Masayuki Hanano, Yutaka Goh, Haruaki Sakurai, Tomohiro Iwano 2021-03-16
10119049 Polishing agent, storage solution for polishing agent and polishing method Makoto Mizutani, Satoyuki Nomura, Haruaki Sakurai, Masayuki Hanano 2018-11-06
9299573 Polishing method Kouji Mishima, Masato Fukasawa 2016-03-29
7374474 Polishing pad for CMP, method for polishing substrate using it and method for producing polishing pad for CMP Masanobu Habiro, Yasuhito Iwatsuki, Hirokazu Hiraoka 2008-05-20
7070670 Adhesive composition, method for preparing the same, adhesive film using the same, substrate for carrying semiconductor and semiconductor device Takeo Tomiyama, Teiichi Inada, Masaaki Yasuda, Keiichi Hatakeyama, Yuuji Hasegawa +8 more 2006-07-04
6786945 Polishing compound and method for polishing substrate Youichi Machii, Naoyuki Koyama, Masato Yoshida 2004-09-07