Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10040971 | Polishing agent and method for polishing substrate using the polishing agent | Yousuke Hoshi, Daisuke Ryuzaki, Shigeru Nobe | 2018-08-07 |
| 9293344 | Cmp polishing slurry and method of polishing substrate | Masato Fukasawa, Yasushi Kurata, Kouji Haga, Toshiaki Akutsu, Yuuto Ootsuki | 2016-03-22 |
| 9165777 | Polishing agent and method for polishing substrate using the polishing agent | Yousuke Hoshi, Daisuke Ryuzaki, Shigeru Nobe | 2015-10-20 |
| 8900477 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | Takeshi Uchida, Tetsuya Hoshino, Hiroki Terazaki, Yasuo Kamigata, Yoshio Honma +1 more | 2014-12-02 |
| 8900335 | CMP polishing slurry and method of polishing substrate | Masato Fukasawa, Kouji Haga, Toshiaki Akutsu | 2014-12-02 |
| 8617275 | Polishing agent and method for polishing substrate using the polishing agent | Yousuke Hoshi, Daisuke Ryuzaki, Shigeru Nobe | 2013-12-31 |
| 8524111 | CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method | Masato Fukasawa, Kazuhiro Enomoto, Chiaki Yamagishi | 2013-09-03 |
| 8226849 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | Takeshi Uchida, Tetsuya Hoshino, Hiroki Terazaki, Yasuo Kamigata, Yoshio Honma +1 more | 2012-07-24 |
| 8168541 | CMP polishing slurry and polishing method | Masato Fukasawa, Masato Yoshida, Yuto Ootsuki, Chiaki Yamagishi, Kazuhiro Enomoto +2 more | 2012-05-01 |
| 8075800 | Polishing slurry and polishing method | Youichi Machii, Masato Yoshida, Masato Fukasawa, Toranosuke Ashizawa | 2011-12-13 |
| 8002860 | CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive | Kouji Haga, Masato Yoshida, Keizou Hirai, Toranosuke Ashizawa, Youiti Machii | 2011-08-23 |
| 7837800 | CMP polishing slurry and polishing method | Masato Fukasawa, Masato Yoshida, Yuto Ootsuki, Chiaki Yamagishi, Kazuhiro Enomoto +2 more | 2010-11-23 |
| 7838482 | CMP polishing compound and polishing method | Masato Fukasawa, Masato Yoshida, Yuto Ootsuki, Chiaki Yamagishi, Kazuhiro Enomoto +2 more | 2010-11-23 |
| 7799686 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | Takeshi Uchida, Tetsuya Hoshino, Hiroki Terazaki, Yasuo Kamigata, Yoshio Honma +1 more | 2010-09-21 |
| 7410409 | Abrasive compound for CMP, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive compound | Kouji Haga, Masato Yoshida, Keizou Hirai, Toranosuke Ashizawa, Youiti Machii | 2008-08-12 |
| 7250369 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | Takeshi Uchida, Tetsuya Hoshino, Hiroki Terazaki, Yasuo Kamigata, Yoshio Honma +1 more | 2007-07-31 |
| 6786945 | Polishing compound and method for polishing substrate | Youichi Machii, Masaya Nishiyama, Masato Yoshida | 2004-09-07 |
| 6642917 | Sign perception system, game system, and computer-readable recording medium having game program recorded thereon | Shigeki Tooyama | 2003-11-04 |
| 4979181 | Vacuum laser irradiating apparatus | Megumi Nakanose, Mitsunori Aoshiba, Tadao Motegi | 1990-12-18 |
| 4756284 | Intake system for internal combustion engine | Haruo Okimoto, Seiji Tashima | 1988-07-12 |