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Sensor system |
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2021-11-23 |
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Composition, hole transport material composition, and ink composition |
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2021-09-14 |
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Organic electronics material and use thereof |
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2020-12-15 |
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Ultrasound probe, performance evaluation method therefor, and ultrasound diagnostic equipment |
Taiichi Takezaki, Shuntaro Machida |
2020-08-25 |
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Sensor characteristic evaluation method and charged particle beam device |
Toshiyuki Mine, Keiji Watanabe, Koji Fujisaki, Masaharu Kinoshita, Masatoshi Morishita |
2020-08-11 |
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Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same |
Tomohiro Iwano, Hirotaka Akimoto, Takenori Narita, Tadahiro Kimura |
2020-07-07 |
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Micro-electro-mechanical-systems processing method, and micro-electro-mechanical-systems processing apparatus |
Keiji Watanabe, Hiroyasu Shichi, Misuzu Sagawa, Toshiyuki Mine |
2020-05-26 |
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| 10610890 |
Ultrasonic transducer element, method of manufacturing the same, and ultrasonic image pickup device |
Hiroaki Hasegawa, Taiichi Takezaki, Shuntaro Machida |
2020-04-07 |
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MEMS manufacturing method and MEMS manufacturing apparatus |
Shuntaro Machida, Nobuyuki Sugii, Keiji Watanabe, Tetsufumi Kawamura, Kazuki Watanabe |
2020-03-31 |
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Ultrasonic transducer, method for making same, ultrasonic transducer array, and ultrasonic test apparatus |
Shuntaro Machida, Tatsuya Nagata, Naoaki Yamashita, Yuko Hanaoka, Yasuhiro Yoshimura |
2020-03-31 |
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Microstructure manufacturing method and ION beam apparatus |
Hiroyasu Shichi, Keiji Watanabe |
2020-02-04 |
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| 10546721 |
Microstructure manufacturing method and microstructure manufacturing apparatus |
Keiji Watanabe, Hiroyasu Shichi |
2020-01-28 |
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| 10410826 |
Device processing method and device processing apparatus |
Tetsufumi Kawamura, Misuzu Sagawa, Kazuki Watanabe, Keiji Watanabe, Shuntaro Machida +1 more |
2019-09-10 |
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Microstructure processing method and microstructure processing apparatus |
Keiji Watanabe, Shuntaro Machida, Katsuya Miura, Aki Takei, Tetsufumi Kawamura +1 more |
2019-07-02 |
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| 10040971 |
Polishing agent and method for polishing substrate using the polishing agent |
Yousuke Hoshi, Naoyuki Koyama, Shigeru Nobe |
2018-08-07 |
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| 9988573 |
Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate |
Tomohiro Iwano, Takenori Narita |
2018-06-05 |
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| 9982177 |
Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same |
Tomohiro Iwano, Hirotaka Akimoto, Takenori Narita, Tadahiro Kimura |
2018-05-29 |
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Optical modulator and method for manufacturing same |
Hideo Arimoto, Kazuki Tani, Takashi Takahama, Yoshitaka Sasago |
2018-01-02 |
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Polishing agent and method for polishing substrate using the polishing agent |
Yousuke Hoshi, Naoyuki Koyama, Shigeru Nobe |
2015-10-20 |
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Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrate |
Takenori Narita, Yousuke Hoshi, Tomohiro Iwano |
2014-05-20 |
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Polishing agent and method for polishing substrate using the polishing agent |
Yousuke Hoshi, Naoyuki Koyama, Shigeru Nobe |
2013-12-31 |
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Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film |
Kouichi Abe, Kei Kasuya, Tetsushi Maruyama, Yousuke Aoki, Kyouko Kojima |
2012-04-17 |
$96,000 |
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Organic siloxane film, semiconductor device using the same, flat panel display device, and raw material liquid |
Hiroshi Fukuda |
2012-01-31 |
$128,000 |
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Liquid crystal display device and dielectric film usable in the liquid crystal display device |
Kazuyoshi Torii, Mutsuko Hatano, Daisuke Sonoda, Toshiki Kaneko |
2011-06-28 |
$117,000 |
