Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10703947 | Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same | Tomohiro Iwano, Hirotaka Akimoto, Tadahiro Kimura, Daisuke Ryuzaki | 2020-07-07 |
| 9988573 | Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate | Tomohiro Iwano, Daisuke Ryuzaki | 2018-06-05 |
| 9982177 | Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same | Tomohiro Iwano, Hirotaka Akimoto, Tadahiro Kimura, Daisuke Ryuzaki | 2018-05-29 |
| 8778803 | CPM slurry for silicon film polishing and polishing method | — | 2014-07-15 |
| 8728341 | Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrate | Daisuke Ryuzaki, Yousuke Hoshi, Tomohiro Iwano | 2014-05-20 |
| 7554199 | Substrate for evaluation | Masaki Ito, Kenji Sameshima | 2009-06-30 |
| 5905117 | Low dielectric resin composition | Shunsuke Yokotsuka, Aya Serita, Ko Aosaki, Ikuo Matsukura, Hiroyuki Morishima +1 more | 1999-05-18 |