Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10037894 | Polishing liquid for metal and polishing method | Yasuhiro ICHIGE, Seiichi Kondo | 2018-07-31 |
| 9293344 | Cmp polishing slurry and method of polishing substrate | Masato Fukasawa, Naoyuki Koyama, Yasushi Kurata, Toshiaki Akutsu, Yuuto Ootsuki | 2016-03-22 |
| 8900335 | CMP polishing slurry and method of polishing substrate | Masato Fukasawa, Naoyuki Koyama, Toshiaki Akutsu | 2014-12-02 |
| 8734204 | Polishing solution for metal films and polishing method using the same | Masato Fukasawa, Hiroshi Nakagawa, Kouji Mishima | 2014-05-27 |
| 8501625 | Polishing liquid for metal film and polishing method | Masato Fukasawa, Jin Amanokura, Hiroshi Nakagawa | 2013-08-06 |
| 8231735 | Polishing slurry for chemical mechanical polishing and method for polishing substrate | Yuto Ootsuki, Yasushi Kurata, Kazuhiro Enomoto | 2012-07-31 |
| 8168541 | CMP polishing slurry and polishing method | Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Chiaki Yamagishi +2 more | 2012-05-01 |
| 8002860 | CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive | Naoyuki Koyama, Masato Yoshida, Keizou Hirai, Toranosuke Ashizawa, Youiti Machii | 2011-08-23 |
| 7837800 | CMP polishing slurry and polishing method | Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Chiaki Yamagishi +2 more | 2010-11-23 |
| 7838482 | CMP polishing compound and polishing method | Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Chiaki Yamagishi +2 more | 2010-11-23 |
| 7410409 | Abrasive compound for CMP, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive compound | Naoyuki Koyama, Masato Yoshida, Keizou Hirai, Toranosuke Ashizawa, Youiti Machii | 2008-08-12 |
| 7311855 | Polishing slurry for chemical mechanical polishing and method for polishing substrate | Yuto Ootsuki, Yasushi Kurata, Kazuhiro Enomoto | 2007-12-25 |