Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9293344 | Cmp polishing slurry and method of polishing substrate | Masato Fukasawa, Naoyuki Koyama, Yasushi Kurata, Kouji Haga, Toshiaki Akutsu | 2016-03-22 |
| 6615499 | Method for producing cerium oxide, cerium oxide abrasive, method for polishing substrate using the same and method for manufacturing semiconductor device | Jun Matsuzawa, Atsushi Sugimoto, Masato Yoshida, Keizou Hirai, Toranosuke Ashizawa | 2003-09-09 |