Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8616936 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2013-12-31 |
| 8162725 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2012-04-24 |
| 8137159 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2012-03-20 |
| 8075800 | Polishing slurry and polishing method | Naoyuki Koyama, Youichi Machii, Masato Yoshida, Masato Fukasawa | 2011-12-13 |
| 8002860 | CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive | Naoyuki Koyama, Kouji Haga, Masato Yoshida, Keizou Hirai, Youiti Machii | 2011-08-23 |
| 7963825 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2011-06-21 |
| 7887609 | Polishing slurry for polishing aluminum film and polishing method for polishing aluminum film using the same | Hiroshi Ono, Yasuo Kamigata | 2011-02-15 |
| 7871308 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2011-01-18 |
| 7867303 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more | 2011-01-11 |
| 7708788 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more | 2010-05-04 |
| 7410409 | Abrasive compound for CMP, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive compound | Naoyuki Koyama, Kouji Haga, Masato Yoshida, Keizou Hirai, Youiti Machii | 2008-08-12 |
| 7163644 | CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate | Toshihiko Akahori, Keizo Hirai, Miho Kurihara, Masato Yoshida, Yasushi Kurata | 2007-01-16 |
| 7115021 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2006-10-03 |
| 6863700 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more | 2005-03-08 |
| 6783434 | CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate | Toshihiko Akahori, Keizo Hirai, Miho Kurihara, Masato Yoshida, Yasushi Kurata | 2004-08-31 |
| 6615499 | Method for producing cerium oxide, cerium oxide abrasive, method for polishing substrate using the same and method for manufacturing semiconductor device | Jun Matsuzawa, Atsushi Sugimoto, Masato Yoshida, Keizou Hirai, Yuuto Ootsuki | 2003-09-09 |
| 6358663 | FLUORESCENT PATTERN, PROCESS FOR PREPARING THE SAME, ORGANIC ALKALI DEVELOPING SOLUTION FOR FORMING THE SAME, EMULSION DEVELOPING SOLUTION FOR FORMING THE SAME AND BACK PLATE FOR PLASMA DISPLAY USING THE SAME | Naoki Kimura, Seiji Tai, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou +4 more | 2002-03-19 |
| 6343976 | Abrasive, method of polishing wafer, and method of producing semiconductor device | Masato Yoshida, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2002-02-05 |
| 6232024 | Fluorescent pattern, process for preparing the same, organic alkali developing solution for forming the same, emulsion developing solution for forming the same and back plate for plasma display using the same | Naoki Kimura, Seiji Tai, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou +4 more | 2001-05-15 |
| 6221118 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more | 2001-04-24 |
| 6194826 | Process for preparing phosphor pattern, phosphor pattern prepared the same and back plate for plasma display panel | Kazuya Satou, Hiroyuki Tanaka, Takeshi Nojiri, Naoki Kimura, Seiji Tai +2 more | 2001-02-27 |
| 5238911 | Oxide superconductor Bi--Sr--Ca--Mg--Ba--Cu--O | Hidegi Kuwajima, Keiji Sumiya, Shuichiro Shimoda, Minoru Ishihara, Shozo Yamana | 1993-08-24 |
| 5194421 | Bi-Pb-Sr-Mg-Ba-Ca-Cu-O oxide superconductors and production thereof | Shuichiro Shimoda, Keiji Sumiya, Hideji Kuwajima, Minoru Ishihara, Shozo Yamana | 1993-03-16 |
| 5147851 | Superconducting thick film circuit board, production thereof, thick film superconductor and production thereof | Shozo Yamana, Hideji Kuwajima, Minoru Ishihara, Keiji Sumiya, Shuichiro Shimoda | 1992-09-15 |
| 4542110 | Process for producing zirconium oxide sintered body | Takao Nakada, Mamoru Kamimura | 1985-09-17 |