Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8900477 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | Takeshi Uchida, Tetsuya Hoshino, Yasuo Kamigata, Naoyuki Koyama, Yoshio Honma +1 more | 2014-12-02 |
| 8616936 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2013-12-31 |
| 8491807 | Abrasive liquid for metal and method for polishing | Takeshi Uchida, Jun Matsuzawa, Tetsuya Hoshino, Yasuo Kamigata, Yoshio Honma +1 more | 2013-07-23 |
| 8226849 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | Takeshi Uchida, Tetsuya Hoshino, Yasuo Kamigata, Naoyuki Koyama, Yoshio Honma +1 more | 2012-07-24 |
| 8162725 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2012-04-24 |
| 8137159 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2012-03-20 |
| 8038898 | Abrasive liquid for metal and method for polishing | Takeshi Uchida, Jun Matsuzawa, Tetsuya Hoshino, Yasuo Kamigata, Yoshio Honma +1 more | 2011-10-18 |
| 7963825 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2011-06-21 |
| 7871308 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2011-01-18 |
| 7867303 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Toranosuke Ashizawa, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more | 2011-01-11 |
| 7799686 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | Takeshi Uchida, Tetsuya Hoshino, Yasuo Kamigata, Naoyuki Koyama, Yoshio Honma +1 more | 2010-09-21 |
| 7799688 | Polishing fluid and method of polishing | Yasushi Kurata, Yasuo Kamigata, Sou Anzai | 2010-09-21 |
| 7708788 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Toranosuke Ashizawa, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more | 2010-05-04 |
| 7250369 | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same | Takeshi Uchida, Tetsuya Hoshino, Yasuo Kamigata, Naoyuki Koyama, Yoshio Honma +1 more | 2007-07-31 |
| 7115021 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2006-10-03 |
| 6899821 | Abrasive liquid for metal and method for polishing | Takeshi Uchida, Jun Matsuzawa, Tetsuya Hoshino, Yasuo Kamigata, Yoshio Honma +1 more | 2005-05-31 |
| 6896825 | Abrasive liquid for metal and method for polishing | Takeshi Uchida, Jun Matsuzawa, Tetsuya Hoshino, Yasuo Kamigata, Yoshio Honma +1 more | 2005-05-24 |
| 6863700 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Toranosuke Ashizawa, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more | 2005-03-08 |
| 6343976 | Abrasive, method of polishing wafer, and method of producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more | 2002-02-05 |
| 6221118 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Toranosuke Ashizawa, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more | 2001-04-24 |