Issued Patents All Time
Showing 1–25 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9714262 | Composition for forming passivation layer, semiconductor substrate having passivation layer, method of producing semiconductor substrate having passivation layer, photovoltaic cell element, method of producing photovoltaic cell element and photovoltaic cell | Shuichiro Adachi, Masato Yoshida, Takeshi Nojiri, Tooru Tanaka, Akihiro Orita +6 more | 2017-07-25 |
| 9293344 | Cmp polishing slurry and method of polishing substrate | Masato Fukasawa, Naoyuki Koyama, Kouji Haga, Toshiaki Akutsu, Yuuto Ootsuki | 2016-03-22 |
| 8999281 | Scintillator single crystal, heat treatment method for production of scintillator single crystal, and method for production of scintillator single crystal | Naoaki Shimura, Tatsuya Usui | 2015-04-07 |
| 8728232 | Single crystal heat treatment method | Tatsuya Usui, Naoaki Shimura, Kazuhisa Kurashige | 2014-05-20 |
| 8696929 | Polishing slurry and polishing method | Katsuyuki Masuda, Hiroshi Ono, Yasuo Kamigata, Kazuhiro Enomoto | 2014-04-15 |
| 8616936 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yuuto Ootuki, Jun Matsuzawa +1 more | 2013-12-31 |
| 8231735 | Polishing slurry for chemical mechanical polishing and method for polishing substrate | Kouji Haga, Yuto Ootsuki, Kazuhiro Enomoto | 2012-07-31 |
| 8168541 | CMP polishing slurry and polishing method | Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Chiaki Yamagishi +2 more | 2012-05-01 |
| 8162725 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yuuto Ootuki, Jun Matsuzawa +1 more | 2012-04-24 |
| 8137159 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yuuto Ootuki, Jun Matsuzawa +1 more | 2012-03-20 |
| 7963825 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yuuto Ootuki, Jun Matsuzawa +1 more | 2011-06-21 |
| 7871308 | Abrasive, method of polishing target member and process for producing semiconductor device | Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yuuto Ootuki, Jun Matsuzawa +1 more | 2011-01-18 |
| 7867303 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Jun Matsuzawa, Kiyohito Tanno +1 more | 2011-01-11 |
| 7837800 | CMP polishing slurry and polishing method | Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Chiaki Yamagishi +2 more | 2010-11-23 |
| 7838482 | CMP polishing compound and polishing method | Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Chiaki Yamagishi +2 more | 2010-11-23 |
| 7799688 | Polishing fluid and method of polishing | Yasuo Kamigata, Sou Anzai, Hiroki Terazaki | 2010-09-21 |
| 7749323 | Single crystal for scintillator and method for manufacturing same | Naoaki Shimura, Tatsuya Usui, Kazuhisa Kurashige | 2010-07-06 |
| 7744666 | Polishing medium for chemical-mechanical polishing, and method of polishing substrate member | Yasuo Kamigata, Takeshi Uchida, Hiroki Terasaki, Akiko Igarashi | 2010-06-29 |
| 7708788 | Cerium oxide abrasive and method of polishing substrates | Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Jun Matsuzawa, Kiyohito Tanno +1 more | 2010-05-04 |
| 7618491 | Scintillator single crystal and production method of same | Naoaki Shimura, Tatsuya Usui, Kazuhisa Kurashige | 2009-11-17 |
| 7531036 | Single crystal heat treatment method | Naoaki Shimura, Tatsuya Usui, Kazuhisa Kurashige | 2009-05-12 |
| 7367870 | Polishing fluid and polishing method | Katsuyuki Masuda, Hiroshi Ono, Yasuo Kamigata, Kazuhiro Enomoto | 2008-05-06 |
| 7319072 | Polishing medium for chemical-mechanical polishing, and method of polishing substrate member | Yasuo Kamigata, Takeshi Uchida, Hiroki Terasaki, Akiko Igarashi | 2008-01-15 |
| 7311855 | Polishing slurry for chemical mechanical polishing and method for polishing substrate | Kouji Haga, Yuto Ootsuki, Kazuhiro Enomoto | 2007-12-25 |
| 7232529 | Polishing compound for chemimechanical polishing and polishing method | Takeshi Uchida, Yasuo Kamigata, Hiroki Terasaki, Tetsuya Hoshino, Akiko Igarashi | 2007-06-19 |