Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8524111 | CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method | Masato Fukasawa, Kazuhiro Enomoto, Naoyuki Koyama | 2013-09-03 |
| 8168541 | CMP polishing slurry and polishing method | Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Kazuhiro Enomoto +2 more | 2012-05-01 |
| 7837800 | CMP polishing slurry and polishing method | Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Kazuhiro Enomoto +2 more | 2010-11-23 |
| 7838482 | CMP polishing compound and polishing method | Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Kazuhiro Enomoto +2 more | 2010-11-23 |
| 5837804 | Polyimides and optical parts obtained by using the same | Nori Sasaki, Shigeo Nara, Hidetaka Sato, Shigeru Hayashida, Masato Taya | 1998-11-17 |
| 5073466 | Electrophotographic member containing a fluorine-containing lubricating agent and process for producing the same | Fuminori Ishikawa, Kunihiro Tamahashi, Shigeharu Onuma, Masatoshi Wakagi, Masanobu Hanazono +5 more | 1991-12-17 |