YO

Yuuto Ootuki

HC Hitachi Chemical Company: 11 patents #133 of 1,946Top 7%
Overall (All Time): #466,316 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
8616936 Abrasive, method of polishing target member and process for producing semiconductor device Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2013-12-31
8162725 Abrasive, method of polishing target member and process for producing semiconductor device Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2012-04-24
8137159 Abrasive, method of polishing target member and process for producing semiconductor device Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2012-03-20
7963825 Abrasive, method of polishing target member and process for producing semiconductor device Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2011-06-21
7871308 Abrasive, method of polishing target member and process for producing semiconductor device Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2011-01-18
7867303 Cerium oxide abrasive and method of polishing substrates Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2011-01-11
7708788 Cerium oxide abrasive and method of polishing substrates Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2010-05-04
7115021 Abrasive, method of polishing target member and process for producing semiconductor device Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2006-10-03
6863700 Cerium oxide abrasive and method of polishing substrates Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2005-03-08
6343976 Abrasive, method of polishing wafer, and method of producing semiconductor device Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2002-02-05
6221118 Cerium oxide abrasive and method of polishing substrates Masato Yoshida, Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa +1 more 2001-04-24