MK

Miho Kurihara

HC Hitachi Chemical Company: 2 patents #701 of 1,946Top 40%
Overall (All Time): #2,153,372 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
7163644 CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate Toshihiko Akahori, Toranosuke Ashizawa, Keizo Hirai, Masato Yoshida, Yasushi Kurata 2007-01-16
6783434 CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate Toshihiko Akahori, Toranosuke Ashizawa, Keizo Hirai, Masato Yoshida, Yasushi Kurata 2004-08-31