Issued Patents All Time
Showing 1–25 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7014788 | Surface treatment method and equipment | Toshiyuki Takamatsu | 2006-03-21 |
| 6579465 | Plasma surface treatment method and resulting device | Toshiyuki Takamatsu | 2003-06-17 |
| 6551939 | Plasma surface treatment method and resulting device | Toshi Takamatsu | 2003-04-22 |
| 6255197 | Hydrogen annealing method and apparatus | Toshiyuki Takamatsu | 2001-07-03 |
| 6168310 | Device for measuring physical quantity using pulsed laser interferometry | Ryo Kurosaki, Jun Kikuchi, Haruhiko Serizawa | 2001-01-02 |
| 6149829 | Plasma surface treatment method and resulting device | Toshiyuki Takamatsu | 2000-11-21 |
| 6115538 | Steam supplying apparatus and method for controlling same | Keisuke Shinagawa, Yuuji Matoba, Yoshimasa Nakano, Tatsuya Takeuchi, Takeshi Miyanaga | 2000-09-05 |
| 6107215 | Hydrogen plasma downstream treatment equipment and hydrogen plasma downstream treatment method | Hiroki Ogawa, Jun Kikuchi | 2000-08-22 |
| 6063300 | Method of manufacturing semiconductor device including light etching | Miki Suzuki, Jun Kikuchi, Mitsuaki Nagasaka | 2000-05-16 |
| 6024045 | Apparatus for fabricating semiconductor device and method for fabricating semiconductor device | Jun Kikuchi, Masao Iga | 2000-02-15 |
| 6007671 | Method for hydrogen plasma down-flow processing and apparatus thereof | Jun Kikuchi | 1999-12-28 |
| 5998104 | Method of stripping a resist mask | Keisuke Shinagawa, Naomichi Abe | 1999-12-07 |
| 5961775 | Apparatus for removing organic resist from semiconductor | Keisuke Shinagawa, Naomichi Abe | 1999-10-05 |
| 5919336 | Apparatus for fabricating semiconductor device and method for fabricating semiconductor device | Jun Kikuchi, Masao Iga | 1999-07-06 |
| RE36224 | Microwave plasma processing process and apparatus | Toshimasa Kisa, Yasunari Motoki | 1999-06-08 |
| 5885361 | Cleaning of hydrogen plasma down-stream apparatus | Jun Kikuchi | 1999-03-23 |
| 5832177 | Method for controlling apparatus for supplying steam for ashing process | Keisuke Shinagawa, Yuuji Matoba, Yoshimasa Nakano, Tatsuya Takeuchi, Takeshi Miyanaga | 1998-11-03 |
| 5795494 | Semiconductor substrate cleaning method and semiconductor device fabrication method | Yuka Hayami, Miki Suzuki, Hiroki Ogawa, Haruhisa Mori, Yoshiko Okui | 1998-08-18 |
| 5773201 | Method of stripping a resist mask | Keisuke Shinagawa, Naomichi Abe | 1998-06-30 |
| 5773316 | Method and device for measuring physical quantity, method for fabricating semiconductor device, and method and device for measuring wavelength | Ryo Kurosaki, Jun Kikuchi, Haruhiko Serizawa | 1998-06-30 |
| 5595916 | Silicon oxide film evaluation method | Hiroki Ogawa, Kenji Ishikawa, Carlos R. Inomata | 1997-01-21 |
| 5478403 | Process and apparatus for ashing treatment | Keisuke Shinagawa | 1995-12-26 |
| 5403436 | Plasma treating method using hydrogen gas | Tetsuya Takeuchi, Takeshi Miyanaga, Yoshimasa Nakano, Yuji Matoba | 1995-04-04 |
| 5397432 | Method for producing semiconductor integrated circuits and apparatus used in such method | Jun-ichi Konno, Keisuke Shinagawa, Toshiyuki Ishida, Takahiro Ito, Tetsuo Kondo +1 more | 1995-03-14 |
| 5364519 | Microwave plasma processing process and apparatus | Toshimasa Kisa, Yasunari Motoki | 1994-11-15 |