Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5078824 | Semiconductor device manufacturing apparatus | — | 1992-01-07 |
| 5057187 | Ashing method for removing an organic film on a substance of a semiconductor device under fabrication | Keisuke Shinagawa, Kenichi Hikazutani | 1991-10-15 |
| 5034090 | Process for manufacturing semiconductor device involving dry etching an organic resist layer | Hiroshi Yano | 1991-07-23 |
| 5024748 | Microwave plasma processing apparatus | — | 1991-06-18 |
| 4987284 | Downstream microwave plasma processing apparatus having an improved coupling structure between microwave plasma | Satoru Mihara, Toshimasa Kisa, Yasunari Motoki | 1991-01-22 |
| 4983254 | Processing for stripping organic material | Keisuke Shinagawa, Kenichi Hikazutani | 1991-01-08 |
| 4980022 | Method of removing a layer of organic matter | Kenichi Hikazutani | 1990-12-25 |
| 4961820 | Ashing method for removing an organic film on a substance of a semiconductor device under fabrication | Keisuke Shinagawa, Kenichi Hikazutani | 1990-10-09 |
| 4938839 | Method of removing photoresist on a semiconductor wafer | Yasunari Motoki, Yoshikazu Kato | 1990-07-03 |
| 4861424 | Ashing process of a resist layer formed on a substrate under fabrication to a semiconductor device | Junichi Konno | 1989-08-29 |
| 4861732 | Method for removing an ion-implanted organic resin layer during fabrication of semiconductor devices | Junichi Konno | 1989-08-29 |
| 4789427 | Method for removing resist from semiconductor device | Yoshikazu Kato, Syouzi Mochizuki | 1988-12-06 |
| 4718976 | Process and apparatus for plasma treatment | — | 1988-01-12 |
| 4609428 | Method and apparatus for microwave plasma anisotropic dry etching | — | 1986-09-02 |
| 4512868 | Microwave plasma processing apparatus | Hiroshi Yano | 1985-04-23 |
| 4423127 | Method of manufacturing a semiconductor device | — | 1983-12-27 |
| 4393807 | Spinner | Atsuyuki Yasuda | 1983-07-19 |