Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5998104 | Method of stripping a resist mask | Shuzo Fujimura, Keisuke Shinagawa | 1999-12-07 |
| 5961775 | Apparatus for removing organic resist from semiconductor | Shuzo Fujimura, Keisuke Shinagawa | 1999-10-05 |
| 5773201 | Method of stripping a resist mask | Shuzo Fujimura, Keisuke Shinagawa | 1998-06-30 |
| 5194364 | Process for formation of resist patterns | Takushi Motoyama | 1993-03-16 |
| 5030316 | Trench etching process | Takushi Motoyama, Satoru Mihara | 1991-07-09 |
| 5017461 | Formation of a negative resist pattern utilize water-soluble polymeric material and photoacid generator | — | 1991-05-21 |
| 4384918 | Method and apparatus for dry etching and electrostatic chucking device used therein | — | 1983-05-24 |