Issued Patents All Time
Showing 51–75 of 96 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9399277 | Polishing apparatus and polishing method | Hiroshi Yoshida, Hozumi Yasuda | 2016-07-26 |
| 9308621 | Method and apparatus for polishing a substrate | Tetsuji Togawa, Shingo Saito, Tomoshi Inoue | 2016-04-12 |
| 9149903 | Polishing apparatus having substrate holding apparatus | Katsuhide Watanabe, Hozumi Yasuda, Satoru Yamaki | 2015-10-06 |
| 9073170 | Polishing apparatus having thermal energy measuring means | Katsuhide Watanabe, Hozumi Yasuda, Satoru Yamaki | 2015-07-07 |
| D729753 | Elastic membrane for semiconductor wafer polishing | Hozumi Yasuda, Osamu Nabeya, Katsuhide Watanabe, Keisuke Namiki | 2015-05-19 |
| 8932106 | Polishing apparatus having thermal energy measuring means | Katsuhide Watanabe, Hozumi Yasuda, Satoru Yamaki | 2015-01-13 |
| 8859070 | Elastic membrane | Hozumi Yasuda, Katsuhide Watanabe, Keisuke Namiki, Osamu Nabeya, Satoru Yamaki +1 more | 2014-10-14 |
| 8845396 | Polishing apparatus | Osamu Nabeya, Tetsuji Togawa, Hozumi Yasuda | 2014-09-30 |
| D711330 | Elastic membrane for semiconductor wafer polishing | Hozumi Yasuda, Osamu Nabeya, Katsuhide Watanabe, Keisuke Namiki | 2014-08-19 |
| 8485866 | Substrate holding apparatus, polishing apparatus, and polishing method | Hozumi Yasuda, Tetsuji Togawa, Osamu Nabeya, Kenichiro Saito, Tomoshi Inoue | 2013-07-16 |
| 8430716 | Polishing method and polishing apparatus | Tetsuji Togawa, Hozumi Yasuda, Osamu Nabeya, Shingo Saito | 2013-04-30 |
| 8357029 | Polishing apparatus | Tetsuji Togawa, Hozumi Yasuda, Koji Saito, Osamu Nabeya, Tomoshi Inoue | 2013-01-22 |
| 8267746 | Substrate holding apparatus, polishing apparatus, and polishing method | Hozumi Yasuda, Tetsuji Togawa, Osamu Nabeya, Kenichiro Saito, Tomoshi Inoue | 2012-09-18 |
| 8100739 | Substrate holding apparatus, polishing apparatus, and polishing method | Hozumi Yasuda, Tetsuji Togawa, Osamu Nabeya, Kenichiro Saito, Tomoshi Inoue | 2012-01-24 |
| 8100743 | Polishing apparatus | Osamu Nabeya, Tetsuji Togawa, Hozumi Yasuda, Koji Saito | 2012-01-24 |
| 8083571 | Polishing apparatus | Osamu Nabeya, Tetsuji Togawa | 2011-12-27 |
| 8070560 | Polishing apparatus and method | Hozumi Yasuda, Tetsuji Togawa | 2011-12-06 |
| 7988537 | Substrate holding apparatus and polishing apparatus | Tetsuji Togawa, Hiroshi Yoshida, Osamu Nabeya, Koichi Fukaya | 2011-08-02 |
| 7967665 | Substrate holding apparatus, polishing apparatus, and polishing method | Hozumi Yasuda, Tetsuji Togawa, Osamu Nabeya, Kenichiro Saito, Tomoshi Inoue | 2011-06-28 |
| D634719 | Elastic membrane for semiconductor wafer polishing apparatus | Hozumi Yasuda, Keisuke Namiki, Osamu Nabeya, Koji Saito, Satoru Yamaki +3 more | 2011-03-22 |
| D633452 | Elastic membrane for semiconductor wafer polishing apparatus | Keisuke Namiki, Hozumi Yasuda, Osamu Nabeya, Shingo Togashi, Satoru Yamaki +1 more | 2011-03-01 |
| 7867063 | Substrate holding apparatus and polishing apparatus | Tetsuji Togawa, Hiroshi Yoshida, Osamu Nabeya, Koichi Fukaya | 2011-01-11 |
| 7850509 | Substrate holding apparatus | Tetsuji Togawa, Ikutaro Noji, Keisuke Namiki, Hozumi Yasuda, Shunichiro Kojima +4 more | 2010-12-14 |
| 7754365 | Membrane electrode assembly, method for manufacturing the same, and fuel cell including the same | Takashi Yasuo, Shinichiro Imura | 2010-07-13 |
| 7635292 | Substrate holding device and polishing apparatus | Tetsuji Togawa, Hiroshi Yoshida, Osamu Nabeya, Koichi Fukaya | 2009-12-22 |