| 7746913 |
Laser system |
Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Robert A. Bergstedt |
2010-06-29 |
| 7715459 |
Laser system |
William N. Partlo, Richard L. Sandstrom |
2010-05-11 |
| 7643529 |
Laser system |
William N. Partlo, Richard L. Sandstrom |
2010-01-05 |
| 7643528 |
Immersion lithography laser light source with pulse stretcher |
William N. Partlo, Alexander I. Ershov, German E. Rylov, Igor V. Fomenkov, Christian J. Wittak +11 more |
2010-01-05 |
| 7630424 |
Laser system |
Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov |
2009-12-08 |
| 7567607 |
Very narrow band, two chamber, high rep-rate gas discharge laser system |
David S. Knowles, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo +10 more |
2009-07-28 |
| 7317196 |
LPP EUV light source |
William N. Partlo, Igor V. Fomenkov, Alexander I. Ershov, David W. Myers |
2008-01-08 |
| 7218661 |
Line selected F2 two chamber laser system |
David S. Knowles, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele +8 more |
2007-05-15 |
| 7154928 |
Laser output beam wavefront splitter for bandwidth spectrum control |
Richard L. Sandstrom, Alexander I. Ershov, Igor V. Fomenkov, William N. Partlo |
2006-12-26 |
| 7088758 |
Relax gas discharge laser lithography light source |
Richard L. Sandstrom, William N. Partlo, Thomas A. Yager, Alexander I. Ershov, Robert Jay Rafac +1 more |
2006-08-08 |
| 7061961 |
Very narrow band, two chamber, high rep-rate gas discharge laser system |
David S. Knowles, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo +10 more |
2006-06-13 |
| 7058107 |
Line selected F2 two chamber laser system |
David S. Knowles, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele +8 more |
2006-06-06 |
| 6985508 |
Very narrow band, two chamber, high reprate gas discharge laser system |
David S. Knowles, Herve A. Besaucele, David W. Meyers, Alexander I. Ershov, William N. Partlo +10 more |
2006-01-10 |
| 6801560 |
Line selected F2 two chamber laser system |
David S. Knowles, Richard L. Sandstrom, German E. Rylov, Eckehard D. Onkels, Herve A. Besaucele +8 more |
2004-10-05 |
| 6713770 |
High resolution spectral measurement device |
Richard L. Sandstrom, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov, Scott T. Smith |
2004-03-30 |
| 6704340 |
Lithography laser system with in-place alignment tool |
Alexander I. Ershov, William N. Partlo, Palash P. Das, Laura S. Casas |
2004-03-09 |
| 6625191 |
Very narrow band, two chamber, high rep rate gas discharge laser system |
David S. Knowles, Herve A. Besaucele, David W. Myers, Alexander I. Ershov, William N. Partlo +10 more |
2003-09-23 |
| 6567450 |
Very narrow band, two chamber, high rep rate gas discharge laser system |
David W. Myers, Herve A. Besaucele, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom +7 more |
2003-05-20 |
| 6538737 |
High resolution etalon-grating spectrometer |
Richard L. Sandstrom, Alexander I. Ershov, William N. Partlo, Igor V. Fomenkov |
2003-03-25 |
| 6532247 |
Laser wavelength control unit with piezoelectric driver |
Ronald Spangler, Robert N. Jacques, George J. Everage, Stuart L. Anderson, Frederick Palenschat +4 more |
2003-03-11 |