Issued Patents All Time
Showing 26–50 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7122291 | Photoresist compositions | Munirathna Padmanaban, Guanyang Lin, Takanori Kudo, Chi-Sun Hong | 2006-10-17 |
| 6991888 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | Munirathna Padmanaban, Takanori Kudo, Sangho Lee, Ralph R. Dammel | 2006-01-31 |
| 6610465 | Process for producing film forming resins for photoresist compositions | Douglas McKenzie, Takanori Kudo, Munirathna Padmanaban | 2003-08-26 |
| 6512087 | Fractionation of resins using a static mixer and a liquid-liquid centrifuge | Stanley F. Wanat, Zhong Xiang | 2003-01-28 |
| 6447980 | Photoresist composition for deep UV and process thereof | Munirathna Padmanaban, Ralph R. Dammel | 2002-09-10 |
| 6297352 | Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge | Stanley F. Wanat | 2001-10-02 |
| 6165675 | Isolation of novolak resin by low temperature sub surface forced steam distillation | Daniel P. Aubin | 2000-12-26 |
| 6121412 | Preparation of fractionated novolak resins by a novel extraction technique | Stanley F. Wanat, John J. Kokoszka, Balaji Narasimhan | 2000-09-19 |
| 6106995 | Antireflective coating material for photoresists | Sunit S. Dixit, Dinesh N. Khanna, Joseph E. Oberlander, Dana L. Durham | 2000-08-22 |
| 6096477 | Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom | Ping-Hung Lu, Michelle Cook | 2000-08-01 |
| 6090533 | Isolation of novolak resin without high temperature distillation and photoresist composition therefrom | Ping-Hung Lu | 2000-07-18 |
| 6045966 | Fractionated novolak resin and photoresist composition therefrom | Michelle Cook, Ping-Hung Lu | 2000-04-04 |
| 6043002 | Metal ion reduction in novolak resin solution using an anion exchange resin | — | 2000-03-28 |
| 6028120 | Chelated polyhydroxstyrene for removing metal ions from aqueous and nonaqueous systems | John Charles Saukaitis, Robert E. Potvin, Mohammad Khadim | 2000-02-22 |
| 5994430 | Antireflective coating compositions for photoresist compositions and use thereof | Shuji Ding, Ping-Hung Lu, Dinesh N. Khanna, Jianhui Shan, Dana L. Durham +1 more | 1999-11-30 |
| 5981145 | Light absorbing polymers | Shuji Ding, Dinesh N. Khanna, Ping-Hung Lu, Jianhui Shan, Ralph R. Dammel +2 more | 1999-11-09 |
| 5976761 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | Daniel P. Aubin, Dinesh N. Khanna, Sunit S. Dixit | 1999-11-02 |
| 5977288 | Fractionated novolak resin and photoresist composition therefrom | Ping-Hung Lu | 1999-11-02 |
| 5962183 | Metal ion reduction in photoresist compositions by chelating ion exchange resin | Daniel P. Aubin | 1999-10-05 |
| 5955570 | Trace metal ion reduction by Ion Exchange Pack | Carlo R. Spilletti, Michelle Cook | 1999-09-21 |
| 5928836 | Fractionated novolak resin copolymer and photoresist composition therefrom | Stanley F. Wanat, Michelle Cook, Douglas McKenzie, Sunit S. Dixit | 1999-07-27 |
| 5910559 | Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom | Ping-Hung Lu, Michelle Cook | 1999-06-08 |
| 5863700 | Isolation of novolak resin without high temperature distillation and photoresist composition therefrom | Ping-Hung Lu | 1999-01-26 |
| 5858627 | Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers | Dinesh N. Khanna, Daniel P. Aubin, Douglas McKenzie | 1999-01-12 |
| 5853954 | Fractionated novolak resin and photoresist composition therefrom | Ping-Hung Lu | 1998-12-29 |