Issued Patents All Time
Showing 51–74 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5853947 | Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate | Stanley F. Wanat, Dinesh N. Khanna, Daniel P. Aubin, Sunit S. Dixit | 1998-12-29 |
| 5837417 | Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition | Dinesh N. Khanna, Daniel P. Aubin, Douglas McKenzie | 1998-11-17 |
| 5830990 | Low metals perfluorooctanoic acid and top anti-reflective coatings for photoresists | — | 1998-11-03 |
| 5750632 | Isolation of novolak resin by low temperature sub surface forced steam distillation | Daniel P. Aubin | 1998-05-12 |
| 5750031 | Process for producing surfactant having a low metal ion level and developer produced therefrom | Daniel P. Aubin | 1998-05-12 |
| 5739265 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | Daniel P. Aubin, Dinesh N. Khanna, Sunit S. Dixit | 1998-04-14 |
| 5693749 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | Daniel P. Aubin, Dinesh N. Khanna, Sunit S. Dixit | 1997-12-02 |
| 5688893 | Method of using a Lewis base to control molecular weight of novolak resins | Daniel P. Aubin, Dana L. Durham, Ralph R. Dammel | 1997-11-18 |
| 5686561 | Metal ion reduction in novolak resin solution using an anion exchange resin | — | 1997-11-11 |
| 5665517 | Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom | Daniel P. Aubin, Elaine G. Kokinda, Dana L. Durham | 1997-09-09 |
| 5656413 | Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom | Daniel P. Aubin | 1997-08-12 |
| 5624789 | Metal ion reduction in top anti-reflective coatings for photoresisis | Dana L. Durham | 1997-04-29 |
| 5614352 | Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin | — | 1997-03-25 |
| 5614349 | Using a Lewis base to control molecular weight of novolak resins | Daniel P. Aubin, Dana L. Durham, Ralph R. Dammel | 1997-03-25 |
| 5594098 | Metal ion reduction in novolak resins and photoresists | Dana L. Durham | 1997-01-14 |
| 5580700 | Metal ion reduction in bottom anti-reflective coatings for use in semiconductor device formation | — | 1996-12-03 |
| 5580949 | Metal ion reduction in novolak resins and photoresists | Dana L. Durham | 1996-12-03 |
| 5565496 | Separating metals using a modified deionizing resin | Philomen Z. deCroos | 1996-10-15 |
| 5543263 | Photoresist having a low level of metal ions | Dana L. Durham | 1996-08-06 |
| 5521052 | Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom | Daniel P. Aubin, Dinesh N. Khanna, Douglas McKenzie | 1996-05-28 |
| 5516886 | Metal ion reduction in top anti-reflective coatings for photoresists | Dana L. Durham | 1996-05-14 |
| 5476750 | Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists | Ping-Hung Lu, Daniel P. Aubin, Ralph R. Dammel, Dana L. Durham | 1995-12-19 |
| 5371169 | Novolak resin mixtures | Ping-Hung Lu, Anthony Canize, Dinesh N. Khanna | 1994-12-06 |
| 5286606 | Process for producing a developer having a low metal ion level | Dana L. Durham | 1994-02-15 |